首页> 外文OA文献 >Ni/Ti reactive multilayers for joining
【2h】

Ni/Ti reactive multilayers for joining

机译:用于连接的Ni / Ti反应性多层

摘要

Reactive multilayers are desirable for a variety of applications including near-net shape shaping of intermetallic compounds, dissimilar/similar joining, as ignition sources and highly localized heat sources. The production of intermetallic compounds from multilayer thin foils/films is a widespread method. Due to its moderate enthalpy of reaction, the Ni-Ti system has received little attention in the context of low temperature joining; although the reaction product, nickel titanide, has promising mechanical properties, like superleasticity or shape memory effect. The aim of this PhD thesis is to study the feasibility of joining NiTi to Ti6Al4V using only the heat released by Ni/Ti reactive multilayers ignited, using a femtosecond laser.Ni/Ti reactive nano-multilayers with different modulation period (Λ =5 nm, 12 nm, 25 nm and 75 nm) and with a total thickness of around 2.5 µm were deposited, utilizing a dual cathode magnetron sputtering equipment, onto different substrates. These multilayer thin films exhibit a columnar growth, independently of the substrates, and a surface roughness that is directly proportional to the modulation period. Structural evolution was followed using in situ synchrotron x-ray diffraction, observing a single step reaction from Ni/Ti multilayers to B2-NiTi, without the formation of intermediate phases and independently of the substrate and modulation period. The temperature at which the multilayer structure evolves to the final phase varies with the period and the heating rate. When the multilayer thin film is deposited onto Ti6Al4V substrates, the nickel from the NiTi reacted multilayer, at temperatures higher than ≈650◦C, diffuse to the beta phase of the substrate leading to phase growth and NiTi2 formation.Ignition experiments were conducted on several of these multilayers using femtosecond laser pulses. It was observed that the substrates thermal properties plays a very important role: while metallic substrates quench the reaction confining it to the interacted laser volume, for zirconia substrates the reaction affected a wider volume. Based on a theoretical approach, it was confirmed that the produced multilayers did not present sufficient number of bilayers to be used as the only heat source available to promote joining. Concluding that, the number of bilayers had to be increased in order for the reaction to become self-sustained. LIPSS patterning of the multilayer revealed that the energy modulation irradiated on the multilayers surface promotes an athermal ablation on the bottom of the crests while, on the top, a small thickness of amorphous NiTi was observed. This indicates that, on the ridges, some of the multilayer reacted and that the process was not fully athermal.Finally, sound joints between NiTi and Ti6Al4V utilizing Ni/Ti multilayers with 12 and 25 nm periods were achieved at temperature as low as 600◦C for 30 min under a pressure of 10 MPa. The joints were processed, while following the phase evolution, using in situ synchrotron x-ray diffraction in transmission mode, revealing that the formation of the NiTi2 is reduced for the joints producedat lower temperatures. The joints presented good interface quality, without any pores or major defects.
机译:反应性多层对于各种应用是合乎需要的,包括金属间化合物的近净形状成形,异种/相似的连接(作为点火源和高度局部的热源)。由多层薄箔/薄膜生产金属间化合物是一种普遍的方法。由于其适度的反应焓,在低温连接的情况下,Ni-Ti体系受到的关注很少。尽管反应产物钛镍具有良好的机械性能,如超晶胞或形状记忆效应。本博士学位论文的目的是研究使用飞秒激光仅使用被点燃的Ni / Ti反应性多层所释放的热量将NiTi连接到Ti6Al4V的可行性。具有不同调制周期(Λ= 5 nm)的Ni / Ti反应性纳米多层使用双阴极磁控溅射设备,将其厚度分别约为12 nm,25 nm和75 nm)(总厚度约为2.5 µm)沉积到不同的基板上。这些多层薄膜表现出柱状生长,独立于基底,并且表面粗糙度与调制周期成正比。使用原位同步加速器X射线衍射跟踪结构演变,观察到从Ni / Ti多层膜到B2-NiTi的一步反应,而没有形成中间相,并且与底物和调制周期无关。多层结构演变为最终相的温度随周期和加热速率而变化。当将多层薄膜沉积到Ti6Al4V衬底上时,来自NiTi的多层镍在高于约650°C的温度下反应,扩散到衬底的β相,导致相生长和NiTi2形成。飞秒激光脉冲对这些多层膜进行分析。可以看出,基材的热性能起着非常重要的作用:金属基材淬灭反应并将其限制在相互作用的激光体积中,而氧化锆基材的反应则影响更大的体积。根据理论方法,可以确定所生产的多层没有足够数量的双层用作唯一可用来促进连接的热源。得出结论,必须增加双层的数量才能使反应自我维持。多层的LIPSS图案显示,照射在多层表面上的能量调制促进了波峰底部的无热烧蚀,而在顶部则观察到小厚度的非晶态NiTi。这表明,在脊上,一些多层发生了反应,并且该过程并未完全失热。最后,在低至600°C的温度下,利用周期为12和25 nm的Ni / Ti多层层,实现了NiTi和Ti6Al4V之间的良好连接在10 MPa的压力下保持30分钟。在相演化之后,在传输模式下使用原位同步加速器X射线衍射对接缝进行了处理,结果表明,在较低温度下产生的接缝减少了NiTi2的形成。接头呈现出良好的界面质量,没有任何孔洞或重大缺陷。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号