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Coherence and imaging properties of non-ideal patterned multilayer structures

机译:非理想图案多层结构的相干性和成像特性

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摘要

Several topics concerning the imaging properties of patterned multilayer mask structures are addressed. Using the split-step beam propagation method in conjunction with linear systems theory, the reflected electric field from a patterned multilayer structure is calculated. This calculation accounts for the finite thickness of the pattern structure and the angular dependence of the multilayer reflector. A coherence mapping relationship is developed for a patterned multilayer structure placed in the object plane of an optical system. It is shown that both the spatial period of the pattern structure as well as the angular dependence of the multilayer reflector determines when a simulation must include angular dependence in the coherence mapping. If the illumination system is non-telecentric, a spatially dependent variation of the image irradiance occurs over the field of view of the optical system. A source with a finite spectral bandwidth causes a substantial irradiance decrease in the final image, due to the spectral dependence of the multilayer structure. In an effort to analyze the effects of roughness in short-wavelength imaging systems, the theory of speckle in partially coherent imaging systems is expanded to include the effects of a pattern structure, as well as imaging system aberrations. Including a pattern structure causes the partially developed speckle to manifest itself as a line edge roughness (LER) in images printed in a binary photoresist. It is shown that the LER can increase as the system becomes more incoherent. It is also shown that defocus causes LER produced in the image plane to dramatically increase. An iterative algorithm is developed to calculate the reflected electric field from a rough multilayer structure, which uses no first-order phase approximation and includes the effects of diffraction within the structure. The iterative algorithm is used with the coherence theory developed in this dissertation to analyze the imaging properties of a patterned multilayer structure. Including the effects of the multilayer structure and the thick pattern in the simulation results in an increase in LER, a slight shift in the ideal focus position and an asymmetry in LER for off-axis illumination.
机译:解决了与图案化多层掩模结构的成像特性有关的几个主题。结合线性系统理论,使用分步光束传播方法,计算了图案化多层结构的反射电场。该计算考虑了图案结构的有限厚度和多层反射器的角度依赖性。针对放置在光学系统的物平面中的图案化多层结构开发了相干映射关系。结果表明,图案结构的空间周期以及多层反射器的角度依赖性都决定了仿真何时必须在相干映射中包括角度依赖性。如果照明系统不是远心的,则在光学系统的视场上会发生图像辐照度的空间相关变化。由于多层结构的光谱依赖性,具有有限光谱带宽的光源导致最终图像中的辐照度大大降低。为了分析短波长成像系统中粗糙度的影响,扩展了部分相干成像系统中的斑点理论,以包括图案结构的影响以及成像系统的像差。包括图案结构会导致部分显影的斑点在二进制光刻胶中打印的图像中表现为线边缘粗糙度(LER)。结果表明,随着系统变得更加不连贯,LER会增加。还显示出散焦导致在图像平面中产生的LER急剧增加。开发了一种迭代算法来计算来自粗糙多层结构的反射电场,该结构不使用一阶相位近似,并且包括结构内的衍射效应。本文将迭代算法与本文开发的相干理论一起用于分析图案化多层结构的成像特性。在仿真中包括多层结构和厚图案的影响会导致LER的增加,理想焦点位置的轻微偏移以及用于轴外照明的LER的不对称性。

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    Beaudry Neil A.;

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  • 年度 2003
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