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Aluminoborophosphosilicate glasses for microelectronics packaging

机译:微电子包装用硼磷硅酸铝玻璃

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摘要

Glasses are used in microelectronic packaging for insulation and passivation purposes. To optimize the performance of these packages, it is necessary to investigate new glasses or improve on properties of the glasses in use. The insulating glass should have low dielectric constant, low dissipation factor, low glass transition temperature, high chemical resistivity, and a thermal expansion coefficient matching the substrate. In this study, various aluminoborophosphosilicate glasses containing Ca(Mg)O, Ca(Mg)F₂, and AlF₃ as flux were investigated. Processing temperatures for these glasses range from 1300°C to 1500°C. The coefficients of thermal expansion range from 4.52 μ/°C to 9.39 μ/°C. The dielectric constant as a function of frequency and composition is in the range of 4.1 to 5.2. The index of refraction for these glasses is in the range of 1.52 to 1.58. Glass transition and softening temperatures as low as 538°C and 622°C, respective, were found. Results of this investigation are discussed in terms of the possible use of aluminoborophosphosilicate glasses in microelectronic packaging.
机译:玻璃在微电子包装中用于绝缘和钝化目的。为了优化这些包装的性能,有必要研究新的眼镜或改善所用眼镜的性能。绝缘玻璃应具有低介电常数,低耗散因数,低玻璃化转变温度,高化学电阻率和与基板匹配的热膨胀系数。在这项研究中,研究了各种以Ca(Mg)O,Ca(Mg)F 2和AlF 3为助熔剂的铝硼磷硅酸盐玻璃。这些玻璃的加工温度范围为1300°C至1500°C。热膨胀系数的范围为4.52μ/°C至9.39μ/°C。介电常数随频率和成分的变化在4.1至5.2的范围内。这些玻璃的折射率在1.52至1.58的范围内。发现玻璃化转变和软化温度分别低至538℃和622℃。根据在微电子包装中可能使用的铝硼磷硅酸盐玻璃讨论了这项研究的结果。

著录项

  • 作者

    Zubair Muhammed 1962-;

  • 作者单位
  • 年度 1991
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  • 原文格式 PDF
  • 正文语种 en_US
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