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Dynamic response and material processing of photorefractive polymer composites

机译:光折变聚合物复合材料的动态响应和材料加工

摘要

This dissertation describes advances in the photorefractive dynamic response, and in the understanding of response limitations. In a PVK/ECZ based composite using a tolane chromophore and TNFDM sensitization, a photorefractive response time constant of 4 ms was observed at an applied field (Eₐ) of 95 V/μm with a writing fluence of 0.5 W/cm², while the birefringence response time was under a millisecond. This showed that the chromophore orientational response does not limit speed, and suggests further investigation of photogeneration and transport processes to improve dynamic response. Another segment of research investigated performance changes by exposure under working conditions. Photorefractive properties for composites using chromophores of varied ionization potential (I(p)) were characterized as a function of exposure at Eₐ = 80 V/um, up to 10⁴ J/cm² total optical field exposure. The response time and photoconductivity were found to fatigue for all samples, but a higher chromophore I(p) was correlated to greater stability. The four-wave mixing dependence upon E a showed a variation in trap density with exposure which verifies the role of the C₆₀ anion, the ionized sensitizer, as a photorefractive trap. The third segment of research was the proof-of-principle of a photorefractive injection molding process. Photorefractive properties of molded materials were verified by four-wave mixing and two-beam coupling measurements. At Eₐ = 95 V/μm a diffraction efficiency of 25-30% and a gain coefficient near 50 cm⁻¹ was observed. This shows industrial processing potential of these materials and provides a path from hand crafted devices to mass-production techniques, promoting commercial acceptance.
机译:本文介绍了光折变动态响应的进展以及对响应限制的理解。在使用戊二酮发色团和TNFDM增感的基于PVK / ECZ的复合材料中,在施加电场(Eₐ)为95 V /μm且写入通量为0.5 W /cm²的情况下,观察到了4毫秒的光折变响应时间常数,而双折射为响应时间不到一毫秒。这表明生色团取向反应不限制速度,并建议进一步研究光生和传输过程以改善动态反应。另一部分研究调查了在工作条件下暴露引起的性能变化。使用具有不同电离势(I(p))的生色团的复合材料的光折变特性被表征为在E 80 = 80 V / um,最高总光场曝光量为10⁴J /cm²时的曝光函数。发现所有样品的响应时间和光电导率均疲劳,但是较高的生色团I(p)与较高的稳定性相关。对E a的四波混合依赖性显示了阱密度随曝光而变化,这证实了C 3阴离子(电离敏化剂)作为光折变阱的作用。研究的第三部分是光折射注射成型工艺的原理证明。通过四波混合和两束耦合测量来验证模制材料的光折变特性。在E 1 = 95V /μm时,观察到衍射效率为25-30%,增益系数接近50cm -1。这显示了这些材料的工业加工潜力,并提供了从手工制作的设备到批量生产技术的途径,从而促进了商业认可度。

著录项

  • 作者

    Herlocker Jon Alan;

  • 作者单位
  • 年度 2000
  • 总页数
  • 原文格式 PDF
  • 正文语种 en_US
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