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Oxidation of trace organic impurities in ultrapure water by UV and ozone

机译:紫外线和臭氧氧化超纯水中的痕量有机杂质

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摘要

In this dissertation, the chemical oxidation of trace organic impurities by the treatment of UV light alone, ozone alone, and the combination of UV light and ozone in ultrapure water is discussed. Eighteen model compounds are chosen as the representative organic contaminants. Significant synergistic removal effect by the oxidation of the combination of UV light and ozone has been observed on all model compounds except for trichloroethylene, benzoic acid, and methionine. The removal efficiency by the oxidation of the combined treatment is observed to be greater than that by the oxidation of UV light alone or ozone alone for all model organics. Based on the same injected amount of contaminants over a given period of time, it is shown that the amount of leftover material after one cycle in the loop in a run with ozone injection is lower than that in a run without ozone injection for most compounds. The photolytic ozonation improves the TOC removal efficiency not only on the UV unit, but also on the loop removal performance. The chemistry, advantages and disadvantages of all those three oxidative methods are discussed. The mechanisms of oxidative reaction for the UV/ozone interactions and of ion exchange in the deionized tank are proposed. The rate coefficient of each reaction for model compound is determined by fitting the model prediction to the experimental data. The metrology for modeling the whole ultrapure water system has been established. The mathematical derivations for that metrology are given. For the purpose of paving the road for the reuse of rinsing wastewater, three cases simulating TOC dynamic responses are discussed, and the chemistry between HCl and organics under the treatment of UV light alone is studied. The combined UV/ozone reaction has been proven to be a better way in removing organic contaminants in terms of particles population number density. The mathematical equation of particle size reduction with its breakage rate and fragmentation distribution function is proposed and validated with the experimental data. It is concluded that the surface erosion is the pathway of size reduction when organic particles are oxidized.
机译:本文讨论了仅在紫外光,臭氧单独处理以及紫外光和臭氧在超纯水中的结合对痕量有机杂质的化学氧化作用。选择了18种模型化合物作为代表性的有机污染物。除三氯乙烯,苯甲酸和蛋氨酸外,在所有模型化合物上均观察到了通过紫外线和臭氧的组合的氧化产生的显着协同去除作用。对于所有模型有机物,观察到通过组合处理的氧化去除的效率要高于单独氧化紫外光或单独氧化臭氧的效率。根据给定时间段内相同的污染物注入量,可以看出,对于大多数化合物,在进行臭氧注入的循环中,一个循环后一个循环后的残留材料量要比不进行臭氧注入的循环中的残留量低。光解臭氧化不仅提高了UV装置的TOC去除效率,而且还提高了毛圈去除性能。讨论了这三种氧化方法的化学性质,优缺点。提出了用于UV /臭氧相互作用的氧化反应机理和去离子池中离子交换的机理。通过将模型预测值拟合到实验数据,可以确定模型化合物每个反应的速率系数。建立了用于对整个超纯水系统进行建模的度量衡。给出了该计量学的数学推导。为了铺平冲洗废水的回用之路,讨论了三种模拟TOC动态响应的情况,并研究了仅在UV光处理下HCl与有机物之间的化学反应。就粒子总数的密度而言,紫外线/臭氧联合反应已被证明是去除有机污染物的一种更好的方法。提出了具有破碎率和碎裂分布函数的粒径减小数学方程,并用实验数据进行了验证。结论是,当有机颗粒被氧化时,表面侵蚀是尺寸减小的途径。

著录项

  • 作者

    Kin Kon-Tsu 1964-;

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  • 年度 1996
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  • 原文格式 PDF
  • 正文语种 en_US
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