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Improved reliability of planar power interconnect with ceramic-based structure

机译:陶瓷基结构的平面电源互连的可靠性得到提高

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摘要

This paper proposes an advanced Si3N4 ceramic-based structure with through vias designed and filled with brazing alloy as a reliable interconnect solution in planar power modules. Finite element (FE) modeling and simulation were first used to predict the potential of using the proposed Si3N4 ceramic-based structure to improve the heat dissipation and reliability of planar interconnects. Power cycling tests and non-destructive microstructural characterization were then performed on Si3N4 ceramic-based structures, flexible printed circuit boards (PCB) and conventional Al wire interconnect samples to evaluate the FE predictions. Both the FE simulations and experimental tests were carried out on single Si diode samples where both the ceramic-based structures and flexible PCBs were bonded on the top sides of Si diodes with eutectic Sn-3.5Ag solder joints. The results obtained demonstrate that Si3N4 ceramic-based structures can significantly improve the reliability of planar interconnects. The experimental average lifetimes and FE simulated maximum creep strain accumulations for the ceramic-based structure and flexible PCB interconnect samples can reasonably be fitted to existing lifetime models for Sn-3.5Ag solder joints. Discrepancies between the models and experimental results can be attributed to defects and poor filling of the brazing alloy in the vias through the Si3N4 ceramic.
机译:本文提出了一种先进的Si3N4陶瓷基结构,该结构具有设计并填充有钎焊合金的通孔,作为平面电源模块中的可靠互连解决方案。首先使用有限元(FE)建模和仿真来预测使用拟议的Si3N4陶瓷基结构改善平面互连的散热和可靠性的潜力。然后对基于Si3N4陶瓷的结构,柔性印刷电路板(PCB)和常规的铝线互连样品进行了功率循环测试和无损微结构表征,以评估有限元预测。有限元模拟和实验测试均在单个Si二极管样品上进行,其中陶瓷基结构和柔性PCB均通过共晶Sn-3.5Ag焊点结合在Si二极管的顶部。获得的结果表明,Si3N4陶瓷基结构可以显着提高平面互连的可靠性。陶瓷基结构和柔性PCB互连样品的实验平均寿命和有限元模拟的最大蠕变应变累积可以合理地拟合到Sn-3.5Ag焊点的现有寿命模型中。模型和实验结果之间的差异可以归因于缺陷和通过Si3N4陶瓷在通孔中钎焊合金的填充不良。

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