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Low Density Metamorphic Quantum Dot structures with emission in the 1.3 - 1.55 ?m window.

机译:低密度变质量子点结构,其发射范围为1.3-1.55 µm。

摘要

Emission of single photons in the 1.3 - 1.55 ?m optoelectronic window is a topic of great technological interest for growing fields such as quantum cryptography and quantum computation; InAs self-assembled quantum dots (QDs) are viable candidates to develop single photon sources due to: i) easy integration in standard optoelectronic device structures, ii) possible tuning of QD emission in the windows of interest, and iii) growth of structures on GaAs substrates, with advantages over the InP option. While good results have been obtained in redshifting light emission up and beyond 1.55 ?m from high density QD structures, emissions beyond 1.3 ?m from low density QDs have been reported much more rarely [1-3]. In order to tune the emission of InAs QDs in the whole 1.3 - 1.6 ?m range, we use the Quantum Dot Strain Engineering (QDSE) approach, where QDs are deposited on InGaAs metamorphic buffers that act as confining layers (CLs). Thanks to the reduction of the QD strain, the QD emission wavelength can be shifted up to 1.59 ?m at RT [4,5]. To achieve low densities we considered the deposition of InAs coverages below the critical thickness for dot nucleation followed by a growth interruption, method that has been used so far only on GaAs [6,7]. We grew by MBE and characterized by PL and AFM quantum dot structures grown on InxGa1-xAs (x = 0.15, 0.30) metamorphic buffers with subcritical coverage and growth interruptions that allow the achievement of 108 cm-2 QD density. We studied the deposition of subcritical coverages on the InGaAs buffers and evidenced the differences with the deposition on GaAs due to the different lattice parameter and composition of the overgrown layer. By carefully adjusting the coverage value and the growth interruption time we were able to obtain QD densities of 5 x 108 cm-2. While by using In0.15Ga0.85As buffers emission at 10K was limited to 1.2 ?m, structures grown on In0.30Ga0.70As buffers show emission peaked at 1.3 ?m. Furthermore, in the x = 0.30 structures, the change in composition of the InyGa1-yAs (y = 0.30, 0.40, 0.50, 0.60) upper confining layers (UCLs) allowed to redshift even further the QD emission, up to a value of 1.64 ?m at 10K, at the cost of a reduction of the light intensity as compared with structures with x = y. This result could allow the development of GaAs-based quantum dot structures for single photon sources with emission in the optoelectronic window of fiber-based telecommunication. References [1]Trevisi G, Seravalli L, Frigeri P and Franchi S. 2009 Nanotechnology 20 415607 [2]Alloing B, Zinoni C, Li LH, Fiore A and Patriarche G 2007 J. Appl. Phys. 101 024918 [3] Semenova E, Hostein R, Patriarche G, Mauguin O, Largeau L, Robert-Philip I, Beveratos A and Lemaıtre A 2008 J. Appl. Phys. 103 103533 [4]Seravalli L, Frigeri P, Trevisi G, Franchi S 2008 Appl. Phys. Lett. 92 213104 [5]Seravalli L, Minelli M, Frigeri P, Franchi S, Guizzetti G, Patrini M, Ciabattoni T, Geddo M 2007 J. Appl. Phys. 101 024313 [6]Song H Z, Usuki T, Nakata Y, Yokoyama N, Sasakura H and Muto S 2006 Phys. Rev. B 73 115327 [7]Li LH, Chauvin N, Patriarche G, Alloing B, Fiore A 2008 J. Appl. Phys. 104 083508.
机译:在1.3-1.55 µm的光电窗口中,单光子的发射对于诸如量子密码术和量子计算等增长领域具有极大的技术意义。 InAs自组装量子点(QD)是开发单个光子源的可行候选者,原因如下:i)易于集成到标准光电器件结构中; ii)可能在感兴趣的窗口中调整QD发射;以及iii)增长结构。 GaAs衬底,具有优于InP选件的优势。虽然在高密度QD结构的红移向上并超过1.55 µm时已获得了良好的结果,但据报道很少有低密度QD超过1.3 µm的发射[1-3]。为了在整个1.3-1.6 µm范围内调整InAs QD的发射,我们使用了量子点应变工程(QDSE)方法,其中QD沉积在InGaAs变形缓冲层上,该缓冲层用作限制层(CL)。由于降低了QD应变,因此在RT [4,5]时,QD发射波长可以移至1.59?m。为了实现低密度,我们认为InAs覆盖层的沉积要低于点成核的临界厚度,然后才发生生长中断,该方法迄今为止仅在GaAs上使用[6,7]。我们由MBE成长,并以InxGa1-xAs(x = 0.15,0.30)变质缓冲液上生长的PL和AFM量子点结构为特征,该缓冲液具有亚临界覆盖和生长中断,可实现108 cm-2 QD密度。我们研究了亚临界覆盖层在InGaAs缓冲层上的沉积,并证明了由于过长层的晶格参数和组成不同而导致的与GaAs沉积的差异。通过仔细调整覆盖率值和生长中断时间,我们能够获得5 x 108 cm-2的QD密度。通过使用In0.15Ga0.85As缓冲液,在10K时的发射限制为1.2?m,而在In0.30Ga0.70As缓冲液上生长的结构显示出在1.3?m处的峰值。此外,在x = 0.30结构中,InyGa1-yAs(y = 0.30,0.40,0.50,0.60)上部约束层(UCL)的成分变化甚至使QD发射进一步红移,直到值1.64与x = y的结构相比,在10K处的λm会降低光强度。这一结果可能允许开发基于GaAs的量子点结构,用于在基于光纤的电信的光电窗口中发射光的单光子源。参考文献[1] Trevisi G,Seravalli L,Frigeri P和Franchi S. 2009纳米技术20 415607 [2] Alloing B,Zinoni C,Li LH,Fiore A和Patriarche G 2007 J. Appl。物理101 024918 [3] Semenova E,Hostein R,Patriarche G,Mauguin O,Largeau L,Robert-Philip I,Beveratos A和LemaıtreA 2008 J. Appl。物理103 103533 [4] Seravalli L,Frigeri P,Trevisi G,Franchi S 2008 Appl。物理来吧92 213104 [5] Seravalli L,Minelli M,Frigeri P,Francis S,Guizzetti G,Patrini M,Ciabattoni T,Geddo M 2007 J. Appl。物理101 024313 [6] Song H Z,Usuki T,Nakata Y,Yokoyama N,Sasakura H和Muto S 2006 Phys。修订版B 73 115327 [7] Li LH,Chauvin N,父权制G,Alloing B,Fiore A 2008 J. Appl。物理104 083508。

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