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Direct observation of electron emission from grain boundaries in CVD diamond by PeakForce-controlled tunnelling atomic force microscopy

机译:通过PeakForce控制的隧道原子力显微镜直接观察CVD金刚石中晶界的电子发射

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摘要

A detailed investigation of electron emission from a set of chemical vapour deposited (CVD) diamond films is reported using high-resolution PeakForce-controlled tunnelling atomic force microscopy (PF-TUNA). Electron field emission originates preferentially from the grain boundaries in low-conductivity polycrystalline diamond samples, and not from the top of features or sharp edges. Samples with smaller grains and more grain boundaries, such as nanocrystalline diamond, produce a higher emission current over a more uniform area than diamond samples with larger grain size. Light doping with N, B or P increases the grain conductivity, with the result that the emitting grain-boundary sites become broader as the emission begins to creep up the grain sidewalls. For heavy B doping, where the grains are now more conducting than the grain boundaries, emission comes from both the grain boundaries and the grains almost equally. Lightly P-doped diamond samples show emission from step-edges on the (111) surfaces. Emission intensity was time dependent, with the measured current dropping to ~10% of its initial value ~30 h after removal from the CVD chamber. This decrease is ascribed to the build-up of adsorbates on the surface along with an increase in the surface conductivity due to surface transfer doping.
机译:使用高分辨率PeakForce控制的隧穿原子力显微镜(PF-TUNA)报告了一组化学气相沉积(CVD)金刚石薄膜对电子发射的详细研究。电子场发射优先源自低电导率多晶金刚石样品中的晶界,而不是特征顶部或尖锐边缘。与具有较大晶粒尺寸的金刚石样品相比,具有较小晶粒和更多晶界的样品(例如纳米晶金刚石)在更均匀的区域上产生更高的发射电流。掺杂N,B或P的光会增加晶粒的导电性,结果,随着发射开始沿晶粒侧壁向上爬,发射的晶界部位变得更宽。对于重质B掺杂,此时的晶粒比晶界更具导电性,其发射几乎同时来自晶界和晶粒。轻度掺P的金刚石样品显示出(111)表面台阶边缘的发射。发射强度与时间有关,从CVD室移出后〜30 h,测得的电流降至其初始值的〜10%。这种减少归因于由于表面转移掺杂而导致的表面上吸附物的积累以及表面电导率的增加。

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