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Impact of buffer layers on thermal properties of AlGaN/GaN-on-SiC high electron mobility transistors (HEMTs)

机译:缓冲层对AlGaN / SiC上的GaN高电子迁移率晶体管(HEMT)的热性能的影响

摘要

In this work, a combination of Raman thermography and finite element thermal modelling was used to examine the thermal conductivities of different buffer layers in four AlGaN/GaN ungated high electron mobility transistors (HEMTs). The parameterisation of the thermal conductivities of iron-doped GaN, carbon-doped GaN and Al0.04Ga0.96N buffer layers gave good agreement in thermal simulations to experimentally-measured GaN temperatures obtained by Raman thermography. This shows the viability of the combined experimental and modelling method used in this work, for the extraction of layer thermal conductivities in complex AlGaN/GaN device heterostructures.
机译:在这项工作中,拉曼热成像和有限元热模型的组合被用于检查四个AlGaN / GaN非电离高电子迁移率晶体管(HEMT)中不同缓冲层的热导率。铁掺杂的GaN,碳掺杂的GaN和Al0.04Ga0.96N缓冲层的热导率的参数设置在热模拟中与通过拉曼热成像获得的实验测量的GaN温度具有良好的一致性。这表明了这项工作中使用的结合实验和建模方法的可行性,该方法可用于提取复杂的AlGaN / GaN器件异质结构中的层导热率。

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