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Fabrication and characterization of AlN thin film bulk acoustic wave resonator

机译:AlN薄膜体声波谐振器的制作与表征

摘要

This dissertation presents the fabrication and characterization of the AlN thin film bulk acoustic wave resonator (FBAR). The bulk acoustic wave (BAW) resonators and filters have been considered the most promising devices used in the frequency control and wireless communication field when the performance frequency is up to GHz range. AlN is a piezoelectric material with hexagonal crystal structure. Some of its properties such as high longitudinal acoustic wave velocity (~11000m/s), high thermal conductivity, and high thermal and chemical stability make it a suitable material to fabricate the thin film bulk acoustic wave resonator.In this study, first, the background that includes the concepts of the FBAR resonators and filters, the piezoelectricity, the material properties of some of the piezoelectric materials and the MEMS techniques is introduced. Following the introduction, the fabrication and characterization of the AlN thin film, the composite BAW resonator and membrane type FBAR are presented. AlN thin films deposited under various sputtering deposition conditions have been investigated and characterized. X-ray diffraction (XRD) and scanning electron microscopy (SEM) characterization results show that the highly c-axis oriented AlN thin films have been deposited on the Si and sapphire substrate at the appropriate conditions. The effective piezoelectric coefficient d33eff and the mechanical properties such as the hardness and the reduced elastic constant of the AlN thin film in the four-layer composite resonator have been measured by the single beam laser interferometer and nano-indentation methods, respectively. Then, the transfer matrix method is developed to characterize the impedances and electromechanical properties of the multilayer FBAR and composite BAW resonator. The effects of the type and thickness of the electrodes and support layers on the resonance frequency and effective electromechanical coupling coefficient are discussed. The resonance frequency control and tuning methods including the connection to the external circuits and the incorporation of the support SiO2 layer are also discussed. In addition, the vector network analyzer has been utilized to measure the resonance frequency response of the four-layer composite BAW resonator and the material properties have been characterized from the experimental data. Lastly, the accomplishments of this study are summarized and future perspectives are provided.
机译:本文介绍了AlN薄膜体声波谐振器(FBAR)的制作和表征。当性能频率达到GHz范围时,体声波(BAW)谐振器和滤波器被认为是在频率控制和无线通信领域中最有前途的设备。 AlN是具有六方晶体结构的压电材料。它的一些特性,例如高的纵向声波速度(〜11000m / s),高的热导率以及高的热稳定性和化学稳定性,使其成为制造薄膜体声波谐振器的合适材料。介绍了包括FBAR谐振器和滤波器的概念,压电性,某些压电材料的材料特性和MEMS技术在内的背景知识。介绍之后,介绍了AlN薄膜,复合BAW谐振器和膜型FBAR的制造和表征。已经研究和表征了在各种溅射沉积条件下沉积的AlN薄膜。 X射线衍射(XRD)和扫描电子显微镜(SEM)表征结果表明,在适当的条件下,高c轴取向的AlN薄膜已经沉积在Si和蓝宝石衬底上。通过单束激光干涉仪和纳米压痕法分别测量了四层复合谐振器中的有效压电系数d33eff和机械性能,例如AlN薄膜的硬度和降低的弹性常数。然后,发展了传递矩阵方法来表征多层FBAR和复合BAW谐振器的阻抗和机电性能。讨论了电极和支撑层的类型和厚度对谐振频率和有效机电耦合系数的影响。还讨论了谐振频率控制和调谐方法,包括与外部电路的连接和支撑SiO2层的结合。此外,矢量网络分析仪已用于测量四层复合BAW谐振器的谐振频率响应,并且已从实验数据中表征了材料性能。最后,总结了本研究的成果并提供了未来的展望。

著录项

  • 作者

    Chen Qingming;

  • 作者单位
  • 年度 2006
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  • 正文语种 en
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