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Structural properties of buried conducting layers formed by very low energy ion implantation of gold into polymer

机译:通过极低能量的离子向聚合物中注入金形成的掩埋导电层的结构特性

摘要

We have investigated the fundamental structural properties of conducting thin films formed by implanting gold ions into polymethylmethacrylate (PMMA) polymer at 49 eV using a repetitively pulsed cathodic arc plasma gun. Transmission electron microscopy images of these composites show that the implanted ions form gold clusters of diameter similar to 2-12 nm distributed throughout a shallow, buried layer of average thickness 7 nm, and small angle x-ray scattering (SAXS) reveals the structural properties of the PMMA-gold buried layer. The SAXS data have been interpreted using a theoretical model that accounts for peculiarities of disordered systems.
机译:我们已经研究了使用重复脉冲阴极电弧等离子体枪以49 eV将金离子注入聚甲基丙烯酸甲酯(PMMA)聚合物中形成的导电薄膜的基本结构性能。这些复合材料的透射电子显微镜图像显示,注入的离子形成直径约2-12 nm的金簇,分布在平均厚度为7 nm的浅埋层中,小角度X射线散射(SAXS)揭示了结构特性PMMA金埋层的表面。 SAXS数据已使用理论模型解释,该模型解释了无序系统的特殊性。

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