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Visible-light sensitive cobalt-doped BiVO4 (Co-BiVO4) photocatalytic composites for the degradation of methylene blue dye in dilute aqueous solutions

机译:可见光敏感的钴掺杂BiVO4(Co-BiVO4)光催化复合物在稀水溶液中降解亚甲基蓝染料

摘要

A series of visible-light sensitive Co-BiVO4 photocatalysts were synthesized by heteronuclear complexing method using diethylenetriamine pentaacetic acid (DTPA) as the chelating agent. The photocatalysts were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscope (FESEM). UV-vis diffuse reflectance spectroscopy (DRS), and Raman spectroscopy. Results indicated that all Co-BiVO4 photocatalysts had a crystal structure of monoclinic scheelite. Loading BiVO4 with cobalt did not alter the crystal structure of the composites. Cobalt was present as oxides and was deposited on the surface of larger BiVO4 particles. The oxidation state of cobalt varied with its content in Co-BiVO4. The photocatalytic activity of Co-BiVO4 was studied by the decolorization of methylene blue (MB). BiVO4 containing 5% (molar wt) of cobalt exhibited the greatest photocatalytic activity with a 85% of MB removal versus 65% by pure BiVO4 in 5 h. Factors such as pH, initial MB concentration, electrolytes, and irradiation conditions that may affect the photodegradation of methylene blue were studied. High pH and low initial MB concentration resulted in fast photocatalytic reaction. Electrolytes, especially those capable of scavenging hydroxyls, can inhibit MB degradation. The stability of the photocatalysts was confirmed using reclaimed Co-BiVO4 in three successive runs. There was no loss of photocatalytic ability in three successive runs each of which lasted for 6h with BM removal remained high at >90%. Results demonstrated clearly that Co-BiVO4 was stable and resistant to photocorrosion during the photocatalytic oxidation of organic compounds such as methylene blue. (C) 2010 Elsevier B.V. All rights reserved.
机译:以二亚乙基三胺五乙酸(DTPA)为螯合剂,通过异核络合法合成了一系列可见光敏感的Co-BiVO4光催化剂。通过X射线衍射(XRD),X射线光电子能谱(XPS),场发射扫描电子显微镜(FESEM)对光催化剂进行了表征。紫外可见漫反射光谱(DRS)和拉曼光谱。结果表明,所有的Co-BiVO4光催化剂均具有单斜白钨矿的晶体结构。用钴加载BiVO4不会改变复合材料的晶体结构。钴以氧化物形式存在,并沉积在较大的BiVO4颗粒的表面上。钴的氧化态随其在Co-BiVO4中的含量而变化。通过亚甲基蓝(MB)的脱色研究了Co-BiVO4的光催化活性。含5%(摩尔重量)钴的BiVO4在5小时内显示出最大的光催化活性,其中85%的MB被去除,而纯BiVO4为65%。研究了可能影响亚甲基蓝光降解的因素,例如pH,初始MB浓度,电解质和辐照条件。高pH和低初始MB浓度导致快速的光催化反应。电解质,尤其是那些能够清除羟基的电解质,可以抑制MB降解。使用回收的Co-BiVO4在三个连续的运行中确认了光催化剂的稳定性。在三个连续的运行中,每个光持续了6小时,而BM的去除率仍保持在> 90%的高水平,没有光催化能力的损失。结果清楚地表明,在有机化合物(如亚甲基蓝)的光催化氧化过程中,Co-BiVO4稳定且耐光腐蚀。 (C)2010 Elsevier B.V.保留所有权利。

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