首页> 外文OA文献 >KINETICS OF INDIUM ATOMIZATION FROM DIFFERENT ATOMIZER SURFACES IN ELECTROTHERMAL ATOMIC-ABSORPTION SPECTROMETRY (ETAAS)
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KINETICS OF INDIUM ATOMIZATION FROM DIFFERENT ATOMIZER SURFACES IN ELECTROTHERMAL ATOMIC-ABSORPTION SPECTROMETRY (ETAAS)

机译:电热原子吸收光谱法(ETAAS)中不同原子表面的原子原子化动力学

摘要

The kinetic parameters of indium atomization in electrothermal atomic absorption spectrometry (ETAAS) have been determined by a newly proposed method. Effect of the atomizer surface and the palladium modifier on the kinetics of indium atomization has been investigated. The mechanisms of indium atomization seem to bc identical for the pyrolytically coated graphite and the uncoated graphite tubes, i.e. the rate-limiting step for the atomization changes from a first order kinetics at lower temperatures into a nearly 1/3 order kinetics at higher temperatures, which may suggest that the analyte moves from a dispersed state to agglomates with increasing temperature. However, for the zirconium coated graphite tube, the atomization of indium is controlled by a single mechanism with the kinetic order of near 2/3 and the activation energy of 186 +/- 13 kJ/mol. Relatively weak indium-zirconium carbide interactions and the release of indium from the sphere of molten indium metal on the zirconium coated surface are suggested. In the presence of palladium, a simple mechanism, i.e. the release of indium from the solid solution of the In and the Pd on the pyrolytically coated graphite surface, is proposed to account for the observed first order kinetics and the activation energy of 421 +/- 27 kJ/mol.
机译:通过新提出的方法确定了电热原子吸收光谱法(ETAAS)中铟雾化的动力学参数。研究了雾化器表面和钯改性剂对铟雾化动力学的影响。对于热解涂层的石墨和未涂层的石墨管,铟雾化的机理似乎是相同的,即雾化的限速步骤从较低温度下的一级动力学变为较高温度下的近1/3级动力学,这可能表明分析物会随着温度的升高而从分散状态迁移到附聚物。但是,对于涂有锆的石墨管,铟的雾化是通过单一机制控制的,其动力学级数接近2/3,活化能为186 +/- 13 kJ / mol。提出了相对较弱的铟-碳化锆相互作用和铟从锆涂覆表面上的熔融铟金属球体中释放出来。在存在钯的情况下,提出了一种简单的机理,即从热解涂层的石墨表面上的In和Pd固溶体中释放铟,以说明所观察到的一级动力学和421 + /的活化能。 -27 kJ /摩尔。

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