首页> 外文OA文献 >Deposition temperature induced conduction band changes in zinc tin oxide buffer layers for Cu(In,Ga)Se2 solar cells
【2h】

Deposition temperature induced conduction band changes in zinc tin oxide buffer layers for Cu(In,Ga)Se2 solar cells

机译:沉积温度诱导的Cu(In,Ga)Se2太阳能电池氧化锌锡缓冲层中的导带变化

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Thin film Cu(In,Ga)Se2 solar cells with ALD-deposited Zn1-xSnxOy buffer layers were fabricated and the solar cell properties were investigated for varying ALD deposition temperatures in the range from 90 °C up to 180 °C. It was found that a process window exists between 105 °C and 135 °C, where high solar cell efficiency can be achieved. At lower ALD deposition temperatures the solar cell performance was mainly limited by low fill factor and at higher temperatures by low open circuit voltage. Numerical simulations and electrical characterization were used to relate the changes in solar cell performance as a function of ALD deposition temperature to changes in the conduction band energy level of the Zn1-xSnxOy buffer layer. The Zn1-xSnxOy films contain small ZnO or ZnO(Sn) crystallites (~10 nm), resulting in quantum confinement effects influencing the optical band gap of the buffer layer. The ALD deposition temperature affects the size of these crystallites and it is concluded that most of the changes in the band gap occur in the conduction band level.
机译:制备了具有ALD沉积Zn1-xSnxOy缓冲层的Cu(In,Ga)Se2薄膜太阳能电池,并研究了在90°C至180°C范围内变化的ALD沉积温度下的太阳能电池性能。发现在105℃至135℃之间存在工艺窗口,在此可以实现高的太阳能电池效率。在较低的ALD沉积温度下,太阳能电池的性能主要受填充系数低的限制,而在较高的温度下受低开路电压的影响。数值模拟和电特性被用来将太阳能电池性能随ALD沉积温度的变化与Zn1-xSnxOy缓冲层的导带能级变化联系起来。 Zn1-xSnxOy膜包含小的ZnO或ZnO(Sn)微晶(〜10 nm),从而导致量子约束效应影响缓冲层的光学带隙。 ALD沉积温度影响这些微晶的尺寸,并且得出的结论是,带隙的大部分变化发生在导带能级中。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号