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Subpicosecond luminescence spectroscopy of exciton localization in InxGa1-xN films

机译:InxGa1-xN薄膜中激子定位的亚皮秒发光光谱

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摘要

We have studied the exciton localization dynamics in InxGa1–xN epitaxial films with different In compositions (x=0.02, 0.05, and 0.09) by means of optical Kerr-gate time-resolved photoluminescence (PL) spectral measurements. By changing excitation wavelength of 150 fs laser pulses, InxGa1–xN films are resonantly excited around their exciton energies at 6 K. Under the resonant excitation, the PL dynamics is sensitive to the In composition of the sample and the excitation laser intensity. In the low In composition samples, the formation time of radiative excitons at localized states is 5–10 ps. In the high In composition samples, the gradual redshift of the PL peak energy is observed within several tens of picoseconds. The radiative recombination processes of excitons are discussed.
机译:我们已经通过光学克尔门时间分辨光致发光(PL)光谱测量研究了具有不同In组成(x = 0.02、0.05和0.09)的InxGa1-xN外延膜中的激子局部动力学。通过改变150 fs激光脉冲的激发波长,InxGa1-xN薄膜在6 K时围绕其激子能量共振激发。在共振激发下,PL动力学对样品的In组成和激发激光强度敏感。在低In成分的样品中,局部状态下辐射激子的形成时间为5-10 ps。在高In成分的样品中,在几十皮秒内观察到PL峰值能量的逐渐红移。讨论了激子的辐射复合过程。

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