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>Reduction in surface recombination and enhancement of light emission in silicon photonic crystals treated by high-pressure water-vapor annealing
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Reduction in surface recombination and enhancement of light emission in silicon photonic crystals treated by high-pressure water-vapor annealing
We propose and demonstrate the application of high-pressure water-vapor annealing (HWA) to silicon photonic crystals for surface passivation. We find that the photoluminescence intensity from a sample treated with HWA is enhanced by a factor of ∼ 6. We confirm that this enhancement originates from a reduction in the surface-recombination velocity (SRV) by a factor of ∼ 0.4. The estimated SRV is as low as 2.1×10[3] cm/s at room temperature. These results indicate that HWA is a promising approach for efficient surface passivation in silicon photonic nanostructures.
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机译:我们提出并证明了高压水蒸气退火(HWA)在硅光子晶体表面钝化中的应用。我们发现用HWA处理过的样品的光致发光强度提高了约6倍。我们证实,这种增强源自表面重组速度(SRV)降低了约0.4倍。在室温下,估计的SRV低至2.1×10 [3] cm / s。这些结果表明,HWA是在硅光子纳米结构中进行有效表面钝化的一种有前途的方法。
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