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Roll-to-roll atomic layer deposition process for flexible electronics applications

机译:适用于柔性电子应用的卷对卷原子层沉积工艺

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摘要

Atomic Layer Deposition (ALD) is the technology of choice where very thin and highqualityfilms are required. Its advantage is its ability to deposit dense and pinhole-freecoatings in a controllable manner. It has already shown promising results in a range ofapplications, e.g. diffusion barrier coatings for OLED displays, surface passivation layersfor solar panels. Spatial Atomic Layer Deposition (SALD) is a concept that allows adramatic increase in ALD throughput. During the SALD process, the substrate movesbetween spatially separated zones filled with the respective precursor gases and reagentsin such a manner that the exposure sequence replicates the conventional ALD cycle.The present work describes the development of a high-throughput ALD process.Preliminary process studies were made using an SALD reactor designed especially for thispurpose. The basic properties of the ALD process were demonstrated using the wellstudiedAl2O3 trimethyl aluminium (TMA)+H2O process. It was shown that the SALDreactor is able to deposit uniform films in true ALD mode. The ALD nature of the processwas proven by demonstrating self-limiting behaviour and linear film growth. The processbehaviour and properties of synthesized films were in good agreement with previous ALDstudies. Issues related to anomalous deposition at low temperatures were addressed as well.The quality of the coatings was demonstrated by applying 20 nm of the Al2O3 on topolymer substrate and measuring its moisture barrier properties. The results of testsconfirmed the superior properties of the coatings and their suitability for flexibleelectronics encapsulation. Successful results led to the development of a pilot scale roll-to-roll coating system. It wasdemonstrated that the system is able to deposit superior quality films with a watertransmission rate of 5x10-6 g/m2day at a web speed of 0.25 m/min. That is equivalent to aproduction rate of 180 m2/day and can be potentially increased by using wider webs.State-of-art film quality, high production rates and repeatable results make SALD thetechnology of choice for manufacturing ultra-high barrier coatings for flexible electronics.
机译:原子层沉积(ALD)是需要非常薄和高质量薄膜的首选技术。它的优点是能够以可控制的方式沉积致密且无针孔的涂层。它已经在一系列应用中显示出令人鼓舞的结果,例如OLED显示器的扩散阻挡涂层,太阳能电池板的表面钝化层。空间原子层沉积(SALD)是一个概念,它可以极大地提高ALD吞吐量。在SALD过程中,基质在充满各自前驱物气体和试剂的空间分隔区域之间移动,以使暴露顺序复制常规ALD循环。本工作描述了高通量ALD工艺的发展。使用专门为此目的设计的SALD反应器制造。 ALD工艺的基本性能是使用经过充分研究的Al2O3三甲基铝(TMA)+ H2O工艺证明的。结果表明,SALDreactor能够以真正的ALD模式沉积均匀的薄膜。该过程的ALD性质已通过展示自限行为和线性薄膜生长得到证明。合成膜的工艺行为和性能与以前的ALD研究一致。还解决了与低温异常沉积有关的问题。通过在聚合物基材上施加20 nm的Al2O3并测量其防潮性能,证明了涂层的质量。测试结果证实了涂层的优越性能及其对柔性电子封装的适用性。成功的结果促成了中试规模卷对卷涂布系统的开发。证明了该系统能够以0.25 m / min的网速以5x10-6 g / m2·day的水传输速率沉积优质薄膜。这相当于180平方米/天的生产率,并且可以通过使用更宽的幅材来提高生产率。最新的薄膜质量,高生产率和可重复的结果使SALD成为制造用于柔性电子产品的超高阻隔涂层的首选技术。

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    Maydannik Philipp;

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  • 年度 2015
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