The laser damage is the result of a laser-matter interaction leading to the physical degradation of the optics, causing a deterioration of their optical function. This is one factor limiting the development of high power lasers and their applications. In dielectric materials and sub-picosecond regime, this phenomenon is based on non-linear processes and depends on the intrinsic properties of the material, as opposed to the nanosecond regime. A bench dedicated to the measurement of laser damage threshold has been developed and applied to study the behavior of optical dielectric thin films at 1030nm. The deterministic nature of sub-picosecond damage was evidenced on the substrates and thin films. A predictive model based on photo-ionisation and avalanche effects was developed for interpretation of the measurements. This model is specific to the case of multilayer optical effects since interference effects and transient response of the films are taken into account. Its effectiveness in predicting the evolution of the damage threshold as a function of pulse duration on HfO2 films. Moreover, the linear behavior of the damage threshold with the band gap has been experimentally observed for oxide materials and described by the model. Finally we present the first exhaustive study on the optical resistance of oxides mixtures, conducted in collaboration with the University of Vilnius, Lithuania, and the Laser Zentrum Hannover LZH, Germany.
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