Interdiffusion et déformations dans des multicouches Cu/Ni et Mo/V: Diffraction des rayons X et simulation de la cinétique

摘要

This work reports the study of interdiffusion and stress on models metallic systems coupling modeling and Xray diffraction known by its high sensibility to the variation of interriticular distances. Model systems chosen are Cu/Ni and Mo/V epitaxial multilayers diposited on MgO substrate. In this two systems the diffusion coefficient is highly dependent on concentration, which should gives during interdiffusion verry asymmetric concentration profiles. To study the evolution of concentration and distance profiles during interdiffusion, a program coupling interdiffusion kinetics and coplanar symmetric diffraction spectra was established with success. It is based on Martin's model (kinetic Ising model in mean field approximation) to simulate interdiffusion and uses kinematic theory to calculate diffraction diagram. In addition, it incorporate elastic relationship between stress and strain fields taking in account the coherence of the interfaces. This program has permitted to establish the existence of a high diffusion asymmetry in Cu/Ni and Mo/V systems with similar parameters controlling the asymmetry of interdiffusion for the studied samples. This parameters are very close to those given by literature established on nonstressed systems. This result indicate that the kinetic of interdiffusion is not affected by the high state of strain in thismultilayers.