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Chalcopyrite CuGaxIn(1-x)Se2 semiconducting thin films produced by radio frequency sputtering

机译:射频溅射制备黄铜矿CuGaxIn(1-x)Se2半导体薄膜

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摘要

CuGaxIn1-xSe2 thin films have been deposited by rf sputtering from three targets with different (Ga,In) content (x = 0.25, x = 0.5, and x = 0.75). A structural, compositional, optical, and electrical study has been carried out for films grown at substrates temperatures higher than 350-degrees-C. We have successfully obtained chalcopyrite single phase stoichiometric films. Very sharp absorption edges are obtained, with band gaps of 1.12, 1.35, and 1.51 eV for x = 0, x = 0.5, and x = 0.75, respectively.
机译:CuRFaxIn1-xSe2薄膜已经通过射频溅射从具有不同(Ga,In)含量(x = 0.25,x = 0.5和x = 0.75)的三个靶材上沉积。已经对在高于350摄氏度的基板温度下生长的薄膜进行了结构,组成,光学和电学研究。我们已经成功地获得了黄铜矿单相化学计量膜。获得非常尖锐的吸收边缘,对于x = 0,x = 0.5和x = 0.75,带隙分别为1.12、1.35和1.51 eV。

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