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Microdoping compensation of microcrystalline silicon obtained by Hot-Wire Chemical Vapour Deposition

机译：热线化学气相沉积获得的微晶硅的微掺杂补偿

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Voz Sánchez Cristóbal; Peiró D.; Fonrodona Turon Marta; Soler Vilamitjana David; Bertomeu i Balagueró Joan; Andreu i Batallé Jordi;
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1. Microdoping compensation of microcrystalline silicon obtained by hot-wire chemical vapour deposition [J] . Voz C., Fonrodona M., Soler D., Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion . 2000,第3期

机译：通过热线化学气相沉积获得的微晶硅的微掺杂补偿
2. Intrinsic microcrystalline silicon prepared by hot-wire chemical vapour deposition for thin film solar cells [J] . Klein S., Finger F., Carius R., Thin Solid Films . 2003,第1a2期

机译：通过热线化学气相沉积制备的用于薄膜太阳能电池的本征微晶硅
3. Very Thin Amorphous and Microcrystalline Silicon Films Deposited by Hot-Wire Chemical Vapour Deposition for Photovoltaic Applications [J] . Urban Weber, Chandrachur Mukherjee, Mrkus Kupich, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2003,第0期

机译：通过热线化学气相沉积沉积非常薄的非晶和微晶硅薄膜，用于光伏应用
4. Very Thin Amorphous and Microcrystalline Silicon Films Deposited by Hot-Wire Chemical Vapour Deposition for Photovoltaic Applications [C] . Urban Weber, Chandrachur Mukherjee, Markus Kupich, International semiconductors conference . 2003

机译：非常薄的无定形和微晶硅膜沉积在光伏应用中的热线化学气相沉积
5. Gas-phase Chemistry of Methyl-Substituted Silanes in a Hot-wire Chemical Vapour Deposition Process [D] . Toukabri, Rim 2013

机译：热线化学气相沉积过程中甲基取代的硅烷的气相化学
6. Quantum Hall resistance standards from graphene grown by chemical vapour deposition onsilicon carbide [O] . F. Lafont, R. Ribeiro-Palau, D. Kazazis, -1

机译：通过化学气相沉积法在石墨烯上生长的量子霍尔电阻标准碳化硅
7. Microdoping compensation of microcrystalline silicon obtained by hot-wire chemical vapour deposition [O] . 2001

机译：通过热线化学气相沉积获得的微晶硅的微型微型补偿

Microdoping compensation of microcrystalline silicon obtained by Hot-Wire Chemical Vapour Deposition

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