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Correlation of EBIC and SWBXT Imaged Defects and Epilayer Growth Pits in 6H-SiC Schottky Diodes

机译:6H-SiC肖特基二极管中EBIC和SWBXT成像缺陷与外延层生长坑的相关性

摘要

We show the first direct experimental correlation between the presence of closed core screw dislocations in 6H-SiC epilayers with recombination centers, as well as with some of the small growth pits on the epilayer surface in lightly-doped 6H-SiC Schottky diodes. At every Synchrotron White-Beam X-ray Topography (SWBXT)-identified closed core screw dislocation, an Electron Beam Induced Current (EBIC) image showed a dark spot indicating a recombination center, and Nomarski optical microscope and Atomic Force Microscope (AFM) images showed a corresponding small growth pit with a sharp apex on the surface of the epilayer.
机译:我们显示了具有重组中心的6H-SiC外延层中的闭芯螺杆位错的存在与轻掺杂6H-SiC肖特基二极管中的外延层表面上的一些小生长坑之间的首次直接实验相关性。在每个同步加速器白光束X射线形貌(SWBXT)识别的闭合芯螺钉错位中,电子束感应电流(EBIC)图像均显示黑点,表明重组中心; Nomarski光学显微镜和原子力显微镜(AFM)图像表现出一个相应的小生长坑,在表皮的表面上有一个尖的顶点。

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