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Plasma-deposited amorphous hydrogenated carbon films and their tribological properties

机译:等离子体沉积非晶氢化碳膜及其摩擦学性能

摘要

Recent work on the properties of diamondlike carbon films and their dependence on preparation conditions are reviewed. The results of the study indicate that plasma deposition enables one to deposit a variety of amorphous hydrogenated carbon (a-C:H ) films exhibiting more diamondlike behavior to more graphitic behavior. The plasma-deposited a-C:H can be effectively used as hard, wear-resistant, and protective lubricating films on ceramic materials such as Si(sub 3)N(sub 4) under a variety of environmental conditions such as moist air, dry nitrogrn, and vacuum.
机译:综述了关于类金刚石碳膜的性质及其对制备条件的依赖性的最新研究。研究结果表明,等离子体沉积使人们能够沉积出各种非晶态氢化碳(a-C:H)薄膜,这些薄膜表现出更多的类金刚石行为到更多的石墨行为。等离子体沉积的aC:H可以有效地在各种环境条件下,例如潮湿的空气,干燥的硝酸盐等,用作陶瓷材料(例如Si(sub 3)N(sub 4))上的硬质,耐磨性和保护性润滑膜。和真空。

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