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Atlas Simulation Based Performance Study of Fully-Depleted Dual-Material-Gate Silicon on Insulator MOSFETs

机译:基于Atlas模拟的绝缘体MOSFET上的全耗尽双栅极硅性能研究

摘要

In this project the characteristics of fully depleted dual metal gate silicon on insulator is studied and presented, the result is compared with that of single material gate MOSFET the result indicates that short channel effect reduces in dual material gate MOSFET.Moreover the electrical characteristics of MOSFET can be controlled by gate length and work function engineering. So this work shows better performance of dual material gate with compare to that of single material gate silicon on insulator
机译:本项目研究并提出了绝缘体上完全耗尽的双金属栅硅的特性,并与单材料栅MOSFET进行了比较,结果表明双材料栅MOSFET的短沟道效应减小。可以通过浇口长度和功函数工程控制。因此,与绝缘体上的单材料栅硅相比,这项工作显示出双材料栅的性能更好。

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  • 作者

    Wali Abdul;

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  • 年度 2015
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