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Radiation-Induced Effects in Chalcogenide-Based Memory Devices and Films

机译:基于硫属化物的存储设备和薄膜中的辐射诱导效应。

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摘要

Continued scaling of memory devices has produced many issues for the current foremost non-volatile memory—the flash memory—leading to the emergence of a wide variety of alternative memory solutions. Redox Conductive Bridge Memory (RCBM) is one such solution that has shown great promise in recent years. However, the performance of these devices under radiation conditions has not been explored in detail. This work investigates the effects of x-rays and electron bombardment on chalcogenide glasses and RCBM devices based on these materials.RCBM devices are a form of Resistance Change Memory, which rely on two distinct resistive states to represent the binary ‘0’ and ‘1’ memory conditions. The functionality of the RCBM devices is based on the growth and dissolution of a conductive filament through an insulating medium sandwiched between two metal electrodes. The presence of the filament represents the on state, while the absence represents the off state.In this work, we studied RCBM devices fabricated utilizing amorphous Ge-Se films as the active medium. Various compositions of Ge-Se films were studied in order to fully understand the effect of radiation over their properties and determine the most stable system. Various compositions of Ge-Se films in contact with an Ag source were studied as well to simulate the exact processes occurring in the RCBM devices under radiation. Several different material characterization methods were utilized in order to perceive all of the effects occurring in the systems comprising the RCBM devices. The major characterization methods include Energy Dispersive Spectroscopy to determine the exact compositions, Raman spectroscopy for analyzing the structural properties, and x-ray diffraction to identify the molecular compounds. Both electron beam radiation and x-ray radiation were found to affect the variety of chalcogenide glass compositions and structures containing Ag in different manners, with each radiation type having a specific impact signature. Correspondingly, radiation exposure also affected the performance parameters of the RCBM devices. The performances of these devices under the influence of both forms of radiation were strongly related to the composition of the film within the device.
机译:存储器设备的持续扩展已经为当前最重要的非易失性存储器(闪存)带来了许多问题,导致出现了各种各样的替代性存储器解决方案。氧化还原导电桥记忆体(RCBM)就是这样一种解决方案,近年来已显示出巨大的希望。但是,尚未详细探讨这些设备在辐射条件下的性能。这项工作研究了X射线和电子轰击对硫族化物玻璃和基于这些材料的RCBM器件的影响。RCBM器件是电阻变化记忆的一种形式,它依靠两个不同的电阻状态来表示二进制“ 0”和“ 1”的记忆条件。 RCBM设备的功能基于导电细丝通过夹在两个金属电极之间的绝缘介质的生长和溶解。灯丝的存在代表导通状态,而不存在则代表关断状态。在这项工作中,我们研究了以非晶态Ge-Se薄膜为活性介质制造的RCBM器件。为了充分了解辐射对其性能的影响并确定最稳定的系统,对锗硒薄膜的各种成分进行了研究。还研究了与银源接触的Ge-Se膜的各种成分,以模拟在辐射下RCBM器件中发生的确切过程。为了感知在包括RCBM装置的系统中发生的所有影响,使用了几种不同的材料表征方法。主要表征方法包括:能量分散光谱法确定确切的组成;拉曼光谱法分析结构特性; X射线衍射法鉴定分子化合物。发现电子束辐射和x射线辐射都以不同的方式影响包含Ag的硫族化物玻璃组合物和结构的各种,每种辐射类型具有特定的冲击特征。相应地,辐射暴露也影响了RCBM设备的性能参数。这些设备在两种辐射形式的影响下的性能都与设备内薄膜的成分密切相关。

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    Wolf Kasandra;

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