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Optical characterization of Mg-doped GaN films grown by metalorganic chemical vapor phase deposition

机译:金属有机化学气相沉积法生长掺镁GaN薄膜的光学表征

摘要

Scanning electron microscopy, micro-Raman, and photoluminescence (PL) measurements are reported for Mg-doped GaN films grown on (0001) sapphire substrates by low-pressure metalorganic chemical vapor phase deposition. The surface morphology, structural, and optical properties of GaN samples with Mg concentrations ranging from 1019 to 1021 cm−3 have been studied. In the scanning micrographs large triangular pyramids are observed, probably due to stacking fault formation and three-dimensional growth. The density and size of these structures increase with the amount of magnesium incorporated in the samples. In the photoluminescence spectra, intense lines were found at 3.36 and 3.31 eV on the triangular regions, where the presence of cubic inclusions was confirmed by micro-Raman measurements. The excitation dependence and temperature behavior of these lines enable us to identify their excitonic nature. From our study we conclude that the interface region between these defects and the surrounding wurtzite GaN could be responsible for PL lines.
机译:报道了通过低压金属有机化学气相沉积在(0001)蓝宝石衬底上生长的Mg掺杂GaN膜的扫描电子显微镜,显微拉曼光谱和光致发光(PL)测量。研究了Mg浓度在1019至1021 cm-3之间的GaN样品的表面形态,结构和光学性质。在扫描显微照片中,观察到大的三角形金字塔,可能是由于堆积断层的形成和三维生长所致。这些结构的密度和尺寸随样品中镁含量的增加而增加。在光致发光光谱中,在三角形区域发现了在3.36和3.31 eV处的强线,其中通过微拉曼测量证实了立方夹杂物的存在。这些线的激发依赖性和温度行为使我们能够确定它们的激子性质。根据我们的研究,我们得出结论,这些缺陷与周围的纤锌矿GaN之间的界面区域可能是PL线的原因。

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