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Minority carrier diffusion lengths and mobilities in low-doped n-InGaAs for focal plane array applications

机译:焦平面阵列应用中低掺杂n-InGaAs中的少数载流子扩散长度和迁移率

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摘要

The hole diffusion length in n-InGaAs is extracted for two samples of different doping concentrations using a set of long and thin diffused junction diodes separated by various distances on the order of the diffusion length. The methodology is described, including the ensuing analysis which yields diffusion lengths between 70 - 85 um at room temperature for doping concentrations in the range of 5 - 9 x 10^15 cm-3. The analysis also provides insight into the minority carrier mobility which is a parameter not commonly reported in the literature. Hole mobilities on the order of 500 - 750 cm2/Vs are reported for the aforementioned doping range, which are comparable albeit longer than the majority hole mobility for the same doping magnitude in p-InGaAs. A radiative recombination coefficient of (0.5-0.2)x10^-10 cm^-3s^-1 is also extracted from the ensuing analysis for an InGaAs thickness of 2.7 um. Preliminary evidence is also given for both heavy and light hole diffusion. The dark current of InP/InGaAs p-i-n photodetectors with 25 and 15 um pitches are then calibrated to device simulations and correlated to the extracted diffusion lengths and doping concentrations. An effective Shockley-Read-Hall lifetime of between 90-200 us provides the best fit to the dark current of these structures.
机译:使用一组长和细的扩散结二极管,分别以不同的距离按扩散长度的顺序提取不同掺杂浓度的两个样品的n-InGaAs中的空穴扩散长度。描述了该方法,包括随后的分析,在室温下,掺杂浓度为5-9 x 10 ^ 15 cm-3时,扩散长度在70-85 um之间。该分析还提供了对少数载流子迁移率的洞察力,这是文献中未普遍报道的参数。对于上述掺杂范围,据报道空穴迁移率约为500-750cm 2 / Vs,尽管对于相同掺杂量的p-InGaAs,其空穴迁移率比多数空穴迁移率更长,但可比。对于随后的InGaAs厚度为2.7 um的分析,还提取了(0.5-0.2)x10 ^ -10 cm ^ -3s ^ -1的辐射复合系数。还提供了重孔和轻孔扩散的初步证据。然后将InP / InGaAs p-i-n InP / InGaAs p-i-n光电探测器具有25和15 um节距的暗电流校准到器件仿真,并与提取的扩散长度和掺杂浓度相关。 Shockley-Read-Hall的有效使用寿命在90-200 us之间,可以最适合这些结构的暗电流。

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