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Influence of power pulse parameters on the microstructure and properties of the AlCrN coatings by a modulated pulsed power magnetron sputtering

机译:功率脉冲参数对调制脉冲功率磁控溅射AlCrN涂层组织和性能的影响

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摘要

In this study, AlCrN coatings were deposited using modulated pulsed power magnetron sputtering (MPPMS) with different power pulse parameters by varying modulated pulsed power (MPP) charge voltages (350 to 550 V). The influence of power pulse parameters on the microstructure, mechanical properties and thermal stability of the coatings was investigated. The results indicated that all the AlCrN coatings exhibited a dense columnar microstructure. Higher charge voltage could facilitate a denser coating microstructure. As the charge voltage increased up to 450 V or higher, the microvoids along the column boundaries disappeared and the coatings became fully dense. The main phase in the AlCrN coatings was the c-(Al, Cr)N solid solution phase with NaCl-type phase structure. A diffraction peak of the h-AlN phase was detected at a 2θ of around 33°, when the charge voltage was higher than 500 V. The hardness of the AlCrN coatings varied as a function of charge voltage. The maximum value of the hardness (30.8 GPa) was obtained at 450 V. All the coatings showed good thermal stability and maintained their structure and mechanical properties unchanged up to 800 °C during vacuum annealing. However, further increasing the annealing temperature to 1000 °C resulted in apparent change in the microstructure and decrease in the hardness. The charge voltages also showed a significant influence on the high-temperature tribological behavior of the coatings. The coating deposited at the charge voltage of 550 V exhibited excellent tribological properties with a low friction coefficient.
机译:在这项研究中,通过改变调制脉冲功率(MPP)充电电压(350至550 V),使用具有不同功率脉冲参数的调制脉冲功率磁控溅射(MPPMS)沉积AlCrN涂层。研究了功率脉冲参数对涂层组织,力学性能和热稳定性的影响。结果表明,所有的AlCrN涂层均表现出致密的柱状微观结构。较高的充电电压可以促进致密的涂层微观结构。当充电电压增加到450 V或更高时,沿柱边界的微孔消失,涂层变得完全致密。 AlCrN涂层的主要相为具有NaCl型相结构的c-(Al,Cr)N固溶体相。当充电电压高于500 V时,在大约33°的2θ处检测到h-AlN相的衍射峰。AlCrN涂层的硬度随充电电压而变化。在450 V时获得了最大值的硬度(30.8 GPa)。在真空退火过程中,所有涂层在高达800°C的温度下均表现出良好的热稳定性并保持其结构和机械性能不变。然而,将退火温度进一步提高到1000°C会导致微观结构的明显变化并降低硬度。充电电压还显示出对涂层的高温摩擦学行为的显着影响。在550 V的充电电压下沉积的涂层表现出优异的摩擦学性能,且摩擦系数低。

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