Design and manufacturing of integrated optical devices in visible spectrum = Diseño y fabricación de dispositivos integrados de guías de onda en espectro visible

摘要

In this project we aim at addressing the study of the full manufacturing process of a photonic integrated circuit, from the initial stage of components design to the tests required to ensure its proper functioning. Its most innovative aspect compared to the existing technology is that the wavelength used belongs to the visible light spectrum. Thus the dimensions of the waveguides have to be significantly reduced. For this reason, the analysis of new manufacturing protocols, using new materials and new techniques, is required. In addition, the current methods will be also modified in order to be optimized for our scenario.udIn a first step, design and simulation of the desired devices were conducted so that a set of different configurations can be approached. After that, theudintegration of the maximum number of these configurations was settled in audchromium mask design. This mask was then used in the photolithographyudprocess to harden SU-8 photoresist over a silicon substrate. Good fabricationudresults were obtained, being able to reach waveguides structures of 0.5 μm thick and 1.5 μm wide. The final chips were characterized in a dark room with two different laser input and proper light guidance was demonstrated as well as output switching.