Growth of Nitrogen-Doped Mg~xZn~1~-~xO for Use in Visible Rejection Photodetectors

摘要

Improvement in the Schottky behavior of metal (Au) contacts with Mg0.01Zn0.99O and Mg0.01Zn0.99O:N thin films were observed by treating the films with hydrogen peroxide (H2O2) (dipping of samples in H2O2 at 100 _C for 3 min). Contacts formed on untreated film showed Ohmic behavior in the current-voltage (I-V ) measurements. The H2O2 treatment led to a smooth surface morphology for the films and resulted in Schottky contact of Au fabricated on the treated films with barrier heights of 0.82≈0.85 eV. The absolute current density at a reverse bias of 3 V was 1≈6 × 10−6 A/cm2 for Au contacts on H2O2-treated films. The treated films showed lower electron concentration than the untreated films due to removal of the relatively high conducting top layers of the thin films. A metal-semiconductor-metal (MSM) detector was fabricated using a Mg0.05Zn0.95O:N film and was characterized for its spectral response.