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Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor

机译：在一个反应器中通过等离子体增强的ALD和CVD制备的有机-无机薄多层膜的防潮性能

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Tim Bülow; Hassan Gargouri; Mirko Siebert; Rolf Rudolph; Hans-Hermann Johannes; Wolfgang Kowalsky;
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1. Gas barrier properties of silicon oxide films prepared by plasma-enhanced CVD using tetramethoxysilane [J] . Teshima K., Inoue Y., Sugimura H., Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2002,第3a4期

机译：使用四甲氧基硅烷通过等离子体增强CVD制备的氧化硅膜的阻气性
2. Bending properties of organic-inorganic multilayer moisture barriers [J] . Seung-Woo Seo, Eun Jung, Heeyeop Chae, Thin Solid Films . 2014,第jana1期

机译：有机-无机多层防潮层的弯曲性能
3. The influence of In/Cu ratio on electrical properties of CuO : In thin films prepared by plasma-enhanced CVD [J] . Hao YL, Gong H Chemical vapor deposition: CVD . 2008,第1a2期

机译：In / Cu比对CuO电性能的影响：在等离子增强CVD制备的薄膜中
4. SYNTHESIS AND STRUCTURAL CHARACTERIZATIONS OF VANADIUM OXIDE THIN FILMS PREPARED BY MOCVD AND ALD [C] . A. Mantoux, H. Groult, P. Doppelt, Electrochemical Society Meeting and International Symposium on Chemical Vapor Deposition XVI and EUROCVD 14 Conference v.1; 20030427-20030502; Paris; FR . 2003

机译：MOCVD和ALD法制备的钒氧化物薄膜的合成与结构表征。
5. Synthesis and characterization of diamond thin films by microwave plasma-enhanced chemical vapor deposition (MPECVD). [D] . Chou, Shih-Feng. 2005

机译：通过微波等离子体增强化学气相沉积（MPECVD）合成和表征金刚石薄膜。
6. Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor [O] . Tim Bülow, Hassan Gargouri, Mirko Siebert, 2014

机译：在一个反应器中通过等离子体增强的ALD和CVD制备的有机-无机薄多层膜的防潮性能
7. Structural, optical and electrical properties of Cu-In-O thin films prepared by plasma-enhanced CVD [O] . HAO YONGLIANG 2008

机译：等离子体增强CVD制备的Cu-In-O薄膜的结构，光学和电学性质
8. Structure and properties of heteroepitaxial Pb(Zr(sub 0.35)Ti(sub 0.65))O(sub 3)/SrRuO(sub 3) multilayer thin films on SrTiO(sub 3)(100) prepared by MOCVD and RF sputtering [R] . Foster, C. M. , Csencsits, R. , Bai, G. R. , 1995

机译：通过mOCVD和RF溅射制备的srTiO（sub 3）（100）上异质外延pb（Zr（sub 0.35）Ti（sub 0.65））O（sub 3）/ srRuO（sub 3）多层薄膜的结构和性质

Moisture barrier properties of thin organic-inorganic multilayers prepared by plasma-enhanced ALD and CVD in one reactor

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