The amorphous carbon films were deposited on silicon-metal substrates by plasma jet chemical vaporuddeposition (PJCVD) and plasma enchanted CVD (PECVD). PJCVD carbon coatings have been prepared atudatmospheric pressure in Ar/ C2H2 and Ar/H2/C2H2 mixtures. The films prepared in Ar/C2H2 plasma are attributedudto graphite-like carbon films. Addition of the hydrogen decreases growth rate and the surfaceudroughness of the coatings, but coatings have low fraction of oxygen (~5 at.%) The formation of the nanocrystallineudgraphite was obtained in Ar/H2/C2H2 plasma. The carbon nanotubes were synthesed by PECVDudusing Au/Cr catalyst particles at low (≤ 450 C; p = 40 Pa ) temperature in pure acetylene.When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35388
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