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Graphite Nanostructures Produce in the Acetylene, Argon-Acetylene and Argon-Hydrogen-Acetylene Plasmas

机译:在乙炔,氩乙炔和氩氢乙炔等离子体中产生石墨纳米结构

摘要

The amorphous carbon films were deposited on silicon-metal substrates by plasma jet chemical vaporuddeposition (PJCVD) and plasma enchanted CVD (PECVD). PJCVD carbon coatings have been prepared atudatmospheric pressure in Ar/ C2H2 and Ar/H2/C2H2 mixtures. The films prepared in Ar/C2H2 plasma are attributedudto graphite-like carbon films. Addition of the hydrogen decreases growth rate and the surfaceudroughness of the coatings, but coatings have low fraction of oxygen (~5 at.%) The formation of the nanocrystallineudgraphite was obtained in Ar/H2/C2H2 plasma. The carbon nanotubes were synthesed by PECVDudusing Au/Cr catalyst particles at low (≤ 450 C; p = 40 Pa ) temperature in pure acetylene.When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35388
机译:通过等离子体喷射化学气相沉积(PJCVD)和等离子体附魔CVD(PECVD)将非晶碳膜沉积在硅金属基底上。 PJCVD碳涂层已在大气压下在Ar / C2H2和Ar / H2 / C2H2混合物中制备。在Ar / C2H2等离子体中制备的薄膜归因于类石墨碳薄膜。氢的添加降低了涂层的生长速率和表面粗糙度,但是涂层的氧含量低(约5at。%)。在Ar / H2 / C2H2等离子体中形成了纳米晶石墨。碳纳米管是通过PECVD 在低(≤450 C; p = 40 Pa)温度下在纯乙炔中用Au / Cr催化剂颗粒合成而制成的。当您引用该文件时,请使用以下链接http://essuir.sumdu。 edu.ua/handle/123456789/35388

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