RF Magnetron Sputtering of Silicon Carbide and Silicon Nitride Films for Solar Cells

摘要

RF-magnetron nonreactive sputtering method from solid-phase target in argon atmosphere was used udfor obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based udon substrates of single crystal silicon of p-type.When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/36380