Plasma Processing Reactor on a Base of Beam Plasma Discharge for Producing and Processing Nanomaterials

摘要

The paper describes the design, modes and applications of novel kind of low pressure plasma processingudreactor based on beam plasma discharge as the plasma source. This reactor ensures flawlessudtreatment of material surface as well as deposition of specific coatings with strictly defined energy of ionsudacting upon a treated surface. Applications of the reactor are represented such as defect-free etching heterostructuresudbased on GaAs and producing structurally perfect samples of graphene.When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35407