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MOCVD Of Cobalt Oxide Using Co-Actylacetonate As Precursor: Thin Film Deposition And Study Of Physical Properties

机译：以丙酮酸钴为前驱体的氧化钴MOCVD：薄膜沉积和物理性质研究

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Jogade S.M.; Joshi P.S.; Jamadar B.N.; Sutrave D.S.;
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年度 2011
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正文语种 en
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2. Deposition of thin films of cobalt oxides by MOCVD [J] . Gulino A., Fiorito G., Fragala I. Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2003,第4期

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MOCVD Of Cobalt Oxide Using Co-Actylacetonate As Precursor: Thin Film Deposition And Study Of Physical Properties

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