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Irradiation Effects on Microstructure and Dielectric Properties of Ba(Mg0.32Co0.02)Nb0.66O3 BMCN Thin Films

机译:辐照对Ba (Mg0.32Co0.02)Nb0.66 O3 BMCN薄膜的微观结构和介电性能的影响

摘要

Ba[(Mg0.32Co0.02)Nb0.66]O3 [BMCN] thin films prepared on Pt-Si, MgO, Silicon and ITO coated glass substrates by Pulsed Laser Deposition Technique are investigated. Relative growth parameters suggest that ITO coated glass substrate has good potential for growing films with near Nano size columnar grains. In comparison to bulk, dielectric constant and dielectric loss increases in BMCN films. This undesirable rise in dielectric loss can be drastically reduced by a factor of more than 1/100th times through Ag15+ ion irradiation at 1 × 1012 ions/cm2 dose.When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/30256
机译:研究了通过脉冲激光沉积技术在Pt-Si,MgO,硅和ITO涂层玻璃基板上制备的Ba [(Mg0.32Co0.02)Nb0.66] O3 [BMCN]薄膜。相对生长参数表明,涂有ITO的玻璃基板具有生长具有接近纳米尺寸柱状晶粒的薄膜的良好潜力。与体积相比,BMCN薄膜的介电常数和介电损耗增加。通过以1×1012离子/ cm2剂量进行Ag15 +离子辐照,可以将介电损耗的这种不期望的上升幅度大大降低1/100倍以上。当您引用此文件时,请使用以下链接http:// essuir。 sumdu.edu.ua/handle/123456789/30256

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