Comparative Characteristics of Stress and Structure of TiN and Ti0.5-xAl0.5YxN Coatings Prepared by Filtered Vacuum-Arc PIIID Method

摘要

A comparative study of the structure and stress state of Ti0.5-xAl0.5YxN and TiN coatings deposited underudidentical conditions from the filtered vacuum-arc plasma under high voltage pulsed bias potential onudthe substrate was carried out. It was found that for Ti0.5Al0.5N coatings the dependence of the residualudstress on the amplitude of the pulsed voltage potential is non-monotonic with a minimum when the amplitudeudis of 1 kV. As for TiN films, a monotonic decrease in the level of residual stresses takes place when theudamplitude of the potential is increased in the range 0-2.5 kV. Non-monotonic dependence for multicomponentudcoatings Ti-Al-Y-N may occur due to the possibility of phase transition associated with the decayudof the supersaturated solid solution (Ti,Al)N stimulated by high energy ion bombardment.When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/34913