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Structure and Properties of Multilayer Nanostructured Coatings TiN/MoN Depending on Deposition Conditions

机译:取决于沉积条件的多层纳米结构涂层TiN / MoN的结构和性能

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摘要

This work presents the results of TiN/MoN coatings studying. These multilayer nanostructured coatingsuddemonstrate dependence on depositions conditions on nanometer level. The influence of nanosized monolayer thickness on structure changing and properties of nanocomposite multilayer coatings TiN/MoN was found. Multilayer TiN/MoN coatings of the total thickness from 6.8 to 8.2 m were obtained using C-PVD method. Thicknesses of monolayers were 2, 10, 20, 40 nm. The structure of samples was studied using X-ray di raction (Bruker D-8 Advance) in Cu K radiation, high resolution transmission electron microscopy with diffraction CFEI EO TechaiF200, scanning electron microscopy with energy dispersive X-ray spectroscopy (JEOL-7001F), and microhardness measurements in dependence on indenter load. Scratch tests (friction, wear, etc.) were also provided using Rockwell-C diamond indenter (CSM Revetest Instruments) with a tip radius of 200 m. Friction and wear behavior were evaluated using ball-on-plate sliding test on a UMT-3MT tribometer (CETR, USA). With decreasing monolayer thickness the hardness value increases, and the size of nanograins reduces. The values obtained for the friction coeffcient of the multilayer system is much smaller than in nanostructured coatings of TiN (nc) or MoN (nc). Annealing showed formation of a (Ti,Mo)N solid solution and small growth of nanocrystals.
机译:这项工作介绍了TiN / MoN涂层的研究结果。这些多层纳米结构涂层证明在纳米水平上对沉积条件的依赖性。发现了纳米单层厚度对纳米复合多层涂层TiN / MoN的结构变化和性能的影响。使用C-PVD方法获得的总厚度为6.8至8.2 m的多层TiN / MoN涂层。单层的厚度为2、10、20、40nm。使用X射线衍射仪(Bruker D-8 Advance)在Cu K辐射中研究样品的结构,使用衍射CFEI EO TechaiF200进行高分辨率透射电子显微镜,使用能量色散X射线光谱仪(JEOL-7001F)进行扫描电子显微镜研究以及根据压头载荷进行的显微硬度测量。还使用尖端半径为200 m的Rockwell-C金刚石压头(CSM Revetest Instruments)提供了划痕测试(摩擦,磨损等)。使用在UMT-3MT摩擦计(CETR,美国)上的滚珠滑动试验来评估摩擦和磨损行为。随着单层厚度的减小,硬度值增加,纳米颗粒的尺寸减小。多层系统的摩擦系数获得的值比TiN(nc)或MoN(nc)的纳米结构涂层小得多。退火显示出形成(Ti,Mo)N固溶体和纳米晶体的少量生长。

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