Hybrid PVD – PECVD process of titanium sputtering in argon and acetylene atmosphere combines aspects of both conventional techniques: sputtering of titanium target (PVD) and acetylene as a source of carbon (PECVD). This process can be used for preparation of metal carbon nanocomposites (MeC/C(:H)) or DLC layers doped with metal (DLC:Me). The aim of this paper is to describe and understand elementary processes in fl uencing the hybrid PVD – PECVD process. A non-monotonous dependence of cathode voltage and current, total pressure and spectral line intensities on acetylene supply fl ow is reported. Explanation of non- monotonous evolutions through the analysis of the target state correlating the process characteristics with properties of coatings prepared by this process is proposed.
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