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Correlation of electrical and optical properties in dually Cd+ and N+ ion-implanted GaAs

机译:Cd +和N +离子注入的GaAs的电学和光学性质的相关性

摘要

Cd in GaAs is an acceptor atom and has the largest atomic diameter among the four commonly-used group-II shallow acceptor impurities (Be, Mg, Zn and Cd). The activation energy of Cd (34.7 meV) is also the largest one in the above four impurities, When Cd is doped by ion implantation, the effects of lattice distortion are expected to be apparently different from those samples ion-implanted by acceptor impurities with smaller atomic diameter. In order to compensate the lattice expansion and simultaneously to adjust the crystal stoichiometry, dual incorporation of Cd and nitrogen (N) was carried out into GaAs, Ion implantation of Cd was made at room temperature, using three energies (400 keV, 210 keV, 110 keV) to establish a flat distribution, The spatial profile of N atoms was adjusted so as to match that of Cd ones, The concentration of Cd and N atoms, [Cd] and [N] varied between 1 x 10(16) cm(-3) and 1 x 10(20) cm(-3). Two type of samples, i.e., solely Cd+ ion-implanted and dually (Cd+ + N+) ion-implanted with [Cd] = [N] were prepared, For characterization, Hall effects and photoluminescence (PL) measurements were performed at room temperature and 2 K, respectively. Hall effects measurements revealed that for dually ion-implanted samples, the highest activation efficiency was similar to 40% for [Cd] (= [N])= 1 x 10(18) cm(-3). PL measurements indicated that [g-g] and [g-g](i) (i = 2, 3, alpha, beta,...), the emissions due to the multiple energy levels of acceptor-acceptor pairs are significantly suppressed by the incorporation of N atoms, For [Cd] = [N] greater than or equal to 1 x 10(19) cm(-3), a moderately deep emission denoted by (Cd, N) is formed at around 1.45-1.41 eV. PL measurements using a Ge detector indicated that (Cd, N) is increasingly red-shifted in energy and its intensity is enhanced with increasing [Cd] = [N], (Cd, N) becomes a dominant emission for [Cd] = [N] = 1 x 10(20) cm(-3). The steep reduction of net hole carrier concentration observed for [Cd]/[N] less than or equal to 1 was ascribed to the formation of (Cd, N) which is presumed to be a novel radiative complex center between acceptor and isoelectronic atoms in GaAs.
机译:GaAs中的Cd是受体原子,并且在四种常用的II类浅受体杂质(Be,Mg,Zn和Cd)中具有最大的原子直径。 Cd(34.7 meV)的活化能也是上述四种杂质中最大的一种,当通过离子注入对Cd进行掺杂时,晶格畸变的影响显然不同于那些由较小杂质的受体离子注入的样品。原子直径。为了补偿晶格膨胀并同时调整晶体化学计量,在GaAs中进行了Cd和氮(N)的双重掺入,在室温下使用三种能量(400 keV,210 keV, 110 keV)建立平坦分布,调整N原子的空间分布,使其与Cd原子的分布相匹配,Cd和N原子的浓度[Cd]和[N]在1 x 10(16)cm之间变化(-3)和1 x 10(20)cm(-3)。制备了两种类型的样品,即仅离子注入的Cd +和离子注入的[Cd] = [N]的双离子(Cd + + N +)。为表征,在室温下进行霍尔效应和光致发光(PL)测量。 2K。霍尔效应测量表明,对于双离子注入样品,最高激活效率类似于[Cd](= [N])= 1 x 10(18)cm(-3)的40%。 PL测量表明,[gg]和[gg](i)(i = 2、3,α,β,...),通过掺入受主-受主对的多种能级,可显着抑制排放N个原子,对于[Cd] = [N]大于或等于1 x 10(19)cm(-3),在(1.45-1.41 eV)左右形成由(Cd,N)表示的中等深度发射。使用Ge探测器的PL测量表明(Cd,N)的能量越来越红移,并且其强度随着[Cd] = [N]的增加而增强,(Cd,N)成为[Cd] = [ N] = 1 x 10(20)cm(-3)。 [Cd] / [N]小于或等于1时观察到的净空穴载流子浓度的急剧下降归因于(Cd,N)的形成,据推测是(Cd,N)是受主和等电子原子之间的新型辐射络合物中心。砷化镓

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