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Surface plasmon enhanced ultraviolet emission from ZnO films deposited on Ag/Si(001) by magnetron sputtering

机译:表面等离子体激元增强磁控溅射沉积在Ag / Si(001)上的ZnO薄膜的紫外线发射

摘要

The ZnO films were grown on Ag/Si(001) substrates by sputtering Ag and ZnO targets successively in a pure Ar ambient. A significant enhancement of ZnO ultraviolet emission and a reduction of its full width of half maximum have been observed while introducing a 100 nm Ag interlayer between ZnO film and Si substrate. Furthermore, a complete suppression of the defect related visible emission was also found for the ZnO/Ag/Si sample. This improved optical performance of ZnO is attributed to the resonant coupling between Ag surface plasmon and ultraviolet emission of ZnO. (c) 2007 American Institute of Physics.
机译:通过在纯Ar环境中依次溅射Ag和ZnO靶,在Ag / Si(001)衬底上生长ZnO膜。当在ZnO薄膜和Si衬底之间引入100 nm Ag中间层时,可以观察到ZnO紫外线发射的显着增强和半峰全宽的减小。此外,对于ZnO / Ag / Si样品,还发现了与缺陷相关的可见光的完全抑制。 ZnO光学性能的提高归因于Ag表面等离子体激元与ZnO紫外线发射之间的共振耦合。 (c)2007年美国物理研究所。

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