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Carrier capture and escape processes in (In,Ga)N singlequantum-well diode under forward bias condition by photoluminescence spectroscopy

机译:光致发光光谱法在正向偏置条件下(In,Ga)N单量子阱二极管中的载流子俘获和逸出过程

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摘要

Carrier capture and escape processes in the super-bright green (In,Ga)N single-quantum-well (SQW)light-emitting diode (LED) has been studied by photoluminescence (PL) spectroscopy under reverse andforward bias conditions. The PL spectra were measured at 20 K under excitation photon energies aboveand below the bandgap energy of GaN barrier layers. The PL spectra under both excitation conditionsshow green emission from the (In,Ga)N SQW layer. The wavelength-integrated PL intensity changesdrastically depending on the applied bias voltage. For the excitation below the bandgap energy of GaN(direct excitation), the PL intensity increases with increasing the forward bias voltage up to +2 V and significantreduction of the PL intensity is observed with further increase of the forward bias voltage. On theother hand, for the excitation above the bandgap energy of GaN (indirect excitation), the PL intensity rapidlyincreases up to +2 V, decreases once, increases again with the maximum value at +3.25 V, and drasticallydecreases again. These differences of the PL intensity variation reflect carrier escape and captureprocesses. That is, in the direct excitation condition, the PL intensity variation indicates the effect of theelectric field on the radiative recombination and the carrier escape processes. In contrast, in the indirectexcitation condition, it is reflected in the carrier transfer and capture processes.
机译:在反向和正向偏置条件下,通过光致发光(PL)光谱研究了超亮绿色(In,Ga)N单量子阱(SQW)发光二极管(LED)中的载流子俘获和逸出过程。 PL光谱是在GaN势垒层的带隙能量之上和之下的激发光子能量下于20 K下测量的。在两种激发条件下的PL光谱均显示(In,Ga)N SQW层的绿色发射。波长积分的PL强度根据施加的偏压急剧变化。对于低于GaN的带隙能量的激发(直接激发),PL强度随正向偏置电压的增加而增加,直至+2 V,并且随着正向偏置电压的进一步增大,PL强度显着降低。另一方面,对于高于GaN的带隙能量的激发(间接激发),PL强度迅速增加至+2 V,一次降低,再次以+3.25 V的最大值增加,然后再次大幅降低。 PL强度变化的这些差异反映了载流子逃逸和捕获过程。即,在直接激发条件下,PL强度变化指示电场对辐射复合和载流子逸出过程的影响。相反,在间接激励条件下,它反映在载流子转移和捕获过程中。

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