Research Update: Atmospheric pressure spatial atomic layer deposition of ZnO thin films: Reactors, doping, and devices

摘要

This is the final published version of the article. It was originally published in APL Materials (Hoye RLZ, Muñoz-Rojas D, Nelson SF, Illiberi A, Poodt P, Roozeboom F, MacManus-Driscoll JL, APL Materials, 2015, 3, 040701, doi:10.1063/1.4916525). The final version is available at http://dx.doi.org/10.1063/1.4916525