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Optical and electrical properties of indium tin oxide thin films sputter-deposited in working gas containing hydrogen without heat treatments

机译:未经热处理溅射沉积在含氢工作气体中的铟锡氧化物薄膜的光电性能

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摘要

Polycrystalline thin films of indium tin oxide sputter-deposited in the working gas containing hydrogen of 0.3–1.5% exhibited transmittance of ≥ 80% for visible lights and blue-shift of ≥ 0.1 eV in the optical absorption energy. The film deposited in the gas containing hydrogen of 1% demonstrated almost flat temperature-dependent resistivity and the lowest resistivity of ≈ 1.5 × 10− 4 Ω cm at room temperature. The carrier density showed an inverse V-shaped behavior with the maximum at the hydrogen concentration of 1%. The mobility stayed at almost constant below the hydrogen concentration of 1% and dropped rather rapidly above 1%.
机译:溅射沉积在氢含量为0.3-1.5%的工作气体中的氧化铟锡多晶薄膜对可见光的透射率≥80%,并且光吸收能量的蓝移≥0.1 eV。沉积在含1%氢的气体中的薄膜在室温下表现出几乎平坦的温度相关电阻率,最低电阻率约为1.5×10-4Ωcm。载流子密度显示出反V形行为,在氢浓度为1%时最大。在氢浓度低于1%时,迁移率几乎保持恒定,而在1%以上时,迁移率迅速下降。

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