首页> 外文OA文献 >Multi-scale modelling of III-nitrides: from dislocations to the electronic structure
【2h】

Multi-scale modelling of III-nitrides: from dislocations to the electronic structure

机译:III氮化物的多尺度建模:从位错到电子结构

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Gallium nitride and its alloys are direct band gap semiconductors with a wide variety of applications. Of particular importance are light emitting diodes and laser diodes. Due to the lack of suitable lattice-matched substrates, epitaxial layers contain a high density of defects such as dislocations. To reduce their number and to design a device with desired specifications, multilayered systems with varying composition (and thus material properties) are grown. Theoretical modelling is a useful tool for gaining understanding of various phenomena and materials properties.The scope of the present work is wide. It ranges from a continuum theory of dislocations treated within the linear elasticity theory, connects the continuum and atomistic level modelling for the case of the critical thickness of thin epitaxial layers, and covers some issues of simulating the electronic structure of III-nitride alloys by means of the first principle methods.The first part of this work discusses several topics involving dislocation theory. The objectives were: (i) to apply general elasticity approaches known from the literature to the specific case of wurtzite materials, (ii) to extend and summarise theoretical studies of the critical thickness in heteroepitaxy. Subsequently, (iii) to develop an improved geometrical model for threading dislocation density reduction during the growth of thick GaN films.The second part of this thesis employs first principles techniques (iv) to investigate the electronic structure of binary compounds (GaN, AlN, InN) and correlate these with experimentally available N K-edge electron energy loss near edge structure (ELNES) data, (v) to apply the special quasi-random structures method to ternary III-nitride wurtzite alloys aiming to develop a methodology for modelling wurtzite alloys and to get quantitative agreement with experimental N K-edge ELNES structures, and (vi) to theoretically study strain effects on ELNES spectra.
机译:氮化镓及其合金是具有多种应用的直接带隙半导体。特别重要的是发光二极管和激光二极管。由于缺乏合适的晶格匹配衬底,外延层包含高密度的缺陷,例如位错。为了减少它们的数量并设计具有所需规格的设备,生长了具有变化的成分(从而改变了材料特性)的多层系统。理论建模是了解各种现象和材料特性的有用工具。本研究的范围很广。它涵盖了在线性弹性理论中处理的位错的连续体理论,并在薄外延层的临界厚度情况下连接了连续体和原子能级模型,并涵盖了通过以下方法模拟III型氮化物合金的电子结构的一些问题:本文的第一部分讨论了涉及位错理论的几个主题。目标是:(i)将文献中已知的一般弹性方法应用于纤锌矿材料的具体情况,(ii)扩展和总结异质外延临界厚度的理论研究。随后,(iii)开发了一种改进的几何模型,用于在厚GaN膜的生长过程中降低穿线位错密度。本论文的第二部分采用第一原理技术(iv)研究二元化合物(GaN,AlN, InN)并将其与实验可获得的N K边缘附近边缘结构的电子能量损失(ELNES)数据相关联,(v)将特殊的准随机结构方法应用于三元III氮化物纤锌矿合金,目的是开发一种建模纤锌矿的方法合金并与实验性N K边缘ELNES结构获得定量一致,并且(vi)从理论上研究应变对ELNES光谱的影响。

著录项

  • 作者

    Holec David;

  • 作者单位
  • 年度 2008
  • 总页数
  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
  • 中图分类

相似文献

  • 外文文献
  • 中文文献
  • 专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号