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In-plane dielectric properties of epitaxial Ba(Zr0.3Ti0.7)O3 thin film grown on lsat (001) single crystal substrate

机译:在lsat(001)单晶衬底上生长的外延Ba(Zr0.3Ti0.7)O3薄膜的面内介电特性

摘要

Ba(Zr0.3Ti0.7)O3 (BZT) thin film was deposited on (LaAlO3)0.3(Sr2AlTaO6)0. 35 [LSAT] (001) single crystal substrate using pulsed laser deposition. The X-ray diffraction pattern reveals an epitaxial growth of the film with a pure perovskite phase. The in-plane dielectric properties of the Ba(Zr0.3Ti0.7)O3 thin film was characterized as a function of frequency (1 kHz-500 MHz), temperature (125 K-373 K) and dc electric field (0-13.3 V/m) using gold interdigital electrodes. The relative permittivity of the film exhibits strong dependence of the dc bias field over the whole frequency range. The relative permittivity has a high tunability of 73%-50% at room temperature in the frequency range of 1 kHz to 500 MHz, showing the potential of our Ba(Zr0.3Ti0.7)O3 thin film to be used in microwave devices.
机译:在(LaAlO3)0.3(Sr2AlTaO6)0上沉积Ba(Zr0.3Ti0.7)O3(BZT)薄膜。 35 [LSAT](001)单晶衬底,使用脉冲激光沉积。 X射线衍射图显示具有纯钙钛矿相的膜的外延生长。 Ba(Zr0.3Ti0.7)O3薄膜的面内介电特性表征为频率(1 kHz-500 MHz),温度(125 K-373 K)和直流电场(0-13.3)的函数V / m)使用金叉指电极。薄膜的相对介电常数在整个频率范围内都表现出强烈的直流偏置场依赖性。相对介电常数在室温下于1 kHz至500 MHz的频率范围内具有73%-50%的高可调谐性,显示出我们的Ba(Zr0.3Ti0.7)O3薄膜可用于微波设备的潜力。

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