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Structural, dielectric and optical properties of Ba(Ti, Zr)O3 thin films prepared by chemical solution deposition

机译:化学溶液沉积制备Ba(Ti,Zr)O3薄膜的结构,介电和光学性质

摘要

Ba(Ti0.95Zr0.05)O3 (BTZ) thin films grown on Pt/Ti/SiO2/Si(100) substrates were prepared by chemical solution deposition. The structure and surface morphology of BTZ thin films has been studied by X-ray diffraction (XRD) and scanning electron microscope (SEM). At 100 kHz, the dielectric constant and dissipation factor of the BTZ film are 121 and 0.016, respectively. The ellipsometric spectrum of the BTZ thin film annealed at 730°C was measured in the range of wavelength from 355 to 1700 nm. Assuming a five-layer model (air/surface roughness layer/BTZ/interface layer/Pt) for the BTZ thin films on platinized silicon substrates, the optical constant spectra (refractive index n and the extinction coefficient k) of the BTZ thin films were obtained.
机译:通过化学溶液沉积制备在Pt / Ti / SiO2 / Si(100)衬底上生长的Ba(Ti0.95Zr0.05)O3(BTZ)薄膜。通过X射线衍射(XRD)和扫描电子显微镜(SEM)研究了BTZ薄膜的结构和表面形态。在100 kHz时,BTZ膜的介电常数和耗散系数分别为121和0.016。在355到1700 nm的波长范围内,测量了730℃退火的BTZ薄膜的椭圆光谱。假设镀铂硅基板上的BTZ薄膜为五层模型(空气/表面粗糙度层/ BTZ /界面层/ Pt),则BTZ薄膜的光学常数光谱(折射率n和消光系数k)为获得。

著录项

  • 作者

    Tang XG; Chan HLW; Ding AL;

  • 作者单位
  • 年度 2004
  • 总页数
  • 原文格式 PDF
  • 正文语种 eng
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