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Gallium Nitride on Silicon HEMTs for Wireless Infrastructure Applications, Thermal Design and Performance

机译:氮化镓在用于无线基础设施应用,散热设计和性能的硅HEMT上

摘要

GaN HEMTs are being touted as the next generation microwave power transistor. Many research groups have reported outstanding DC and RF results on small periphery devices. However, the data on larger devices is somewhat limited. This paper will present results on large periphery devices (18 mm total gate width). Results from DC, RF and Linearity measurements will be presented. In addition a detailed thermal analysis based on simulation and measurement will be discussed. To our knowledge this is the first time the thermal characteristics of large periphery GaN -on-Si devices has been presented. Finally, the thermal model is used to study the thermal performance of these devices on different substrates. The results illustrate that GaN-on-Si is a viable approach for handling the large thermal dissipation requirements of microwave power transistors.
机译:GaN HEMT被吹捧为下一代微波功率晶体管。许多研究小组报告了在小型外围设备上出色的DC和RF结果。但是,较大设备上的数据有所限制。本文将介绍大型外围设备(总门宽度为18 mm)的结果。将显示DC,RF和线性度测量的结果。此外,还将讨论基于仿真和测量的详细热分析。据我们所知,这是首次提出大外围硅基GaN器件的热特性。最后,使用热模型来研究这些器件在不同基板上的热性能。结果表明,GaN-on-Si是一种可行的方法,可以满足微波功率晶体管的大量散热要求。

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