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Reduced short channel effects in selectively dry gate recessed P-doped buffered pseudomorphic HEMTs

机译:在选择性地干栅凹入的P掺杂缓冲伪晶HEMT中减少了短沟道效应

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摘要

We report both on the design by numerical simulation of pseudomorphic HEMTs with p-doped and undoped buffer layers and on their fabrication. We report that the p-buffer helps to reduce short channel effects in scaled 100 nm devices. To the authors' knowledge this is the first time that the application of p-doped buffer layers to HEMTs has been demonstrated.
机译:我们通过数值模拟对带有p掺杂和未掺杂缓冲层的伪晶HEMT进行报告,并报告其制造工艺。我们报告说,p缓冲器有助于减少规模化100 nm器件中的短通道效应。据作者所知,这是首次证明将p型掺杂缓冲层应用于HEMT。

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