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He + -and Fe+ -ion bombardments in the electrical isolation of InP/InGaAs HBT Structures

机译:InP / InGaAs HBT结构的电隔离中的He +和Fe +离子轰击

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摘要

We have investigated He + -and Fe + -ion bombardments in the electrical isolation of InP/InGaAs HBT and n-InGaAs structures.Single energy of He -ions were bombarded at room temperature whereas multi-energy Fe + -ions were bombarded at 77K and room temperatures.At RT bombardment,maximum Rsh of 5x10 4 Ω/sq and 8x10 4 Ω/sq for He-ions whereas 1x10 5 Ω/sq and ~10 6 Ω/sq for Fe- ions were obtained for the HBT and n-InGaAs structures, respectively.At 77K bombardment,an increase of over five orders of magnitude in Rsh (~5x10 6Ω/sq)when compared to un-bombarded samples,which is very close to the intrinsic value for n-InGaAs (~1x10 7Ω/sq).This is significantly higher than the R bombardment results.ud
机译:我们研究了InP / InGaAs HBT和n-InGaAs结构的电隔离中的He +和Fe +离子轰击。He离子的单能在室温下被轰击,而多能Fe +离子在77K时被轰击。在RT轰击下,He离子的最大Rsh值为5x10 4Ω/ sq和Hex离子的最大Rsh为8x10 4 and / sq,而HBT和n的Fe离子的最大Rsh分别为1x10 5Ω/ sq和〜10 6Ω/ sq。 -InGaAs结构。在77K轰击时,与未轰击样品相比,Rsh(〜5x106Ω/ sq)增加了五个数量级,非常接近n-InGaAs的固有值(〜1x10 7Ω/ sq)。这明显高于R轰击的结果。 ud

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